发明申请
- 专利标题: Optical measurement substrate and method of manufacturing the same
- 专利标题(中): 光学测量基板及其制造方法
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申请号: US11341857申请日: 2006-01-30
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公开(公告)号: US20060170915A1公开(公告)日: 2006-08-03
- 发明人: Koichiro Nakamura , Koji Fujita , Koki Tanamura , Yasunori Arima
- 申请人: Koichiro Nakamura , Koji Fujita , Koki Tanamura , Yasunori Arima
- 优先权: JPP2005-022033 20050128
- 主分类号: G01N1/10
- IPC分类号: G01N1/10
摘要:
A masking pattern is performed on a substrate by using materials that are weakly adhered to the substrate, and then the masked substrate is etched. Since the mask is weakly adhered to the substrate, the mask is peeled off from the surface of the substrate, so that a gap is generated between the mask and the substrate, and then anisotropic etching is performed. According to this method, it is possible to easily manufacture an optical measurement substrate having recesses whose sectional shape can be approximated to a curve having inflection points. Therefore, optical characteristics of a minute amount of substances can be evaluated efficiently without the loss of incident and reflected light even when measuring light is incident at an angle of less than 45 degrees.