Optical measurement substrate and method of manufacturing the same
    1.
    发明申请
    Optical measurement substrate and method of manufacturing the same 审中-公开
    光学测量基板及其制造方法

    公开(公告)号:US20060170915A1

    公开(公告)日:2006-08-03

    申请号:US11341857

    申请日:2006-01-30

    IPC分类号: G01N1/10

    摘要: A masking pattern is performed on a substrate by using materials that are weakly adhered to the substrate, and then the masked substrate is etched. Since the mask is weakly adhered to the substrate, the mask is peeled off from the surface of the substrate, so that a gap is generated between the mask and the substrate, and then anisotropic etching is performed. According to this method, it is possible to easily manufacture an optical measurement substrate having recesses whose sectional shape can be approximated to a curve having inflection points. Therefore, optical characteristics of a minute amount of substances can be evaluated efficiently without the loss of incident and reflected light even when measuring light is incident at an angle of less than 45 degrees.

    摘要翻译: 通过使用弱粘附于衬底的材料在衬底上进行掩模图案,然后蚀刻掩模衬底。 由于掩模弱粘附到基板上,所以掩模从基板的表面剥离,从而在掩模和基板之间产生间隙,然后进行各向异性蚀刻。 根据该方法,可以容易地制造具有可以近似为具有拐点的曲线的具有凹部的光学测量基板。 因此,即使当以小于45度的角度入射测量光时,也能够有效地评价微量物质的光学特性,而不会引起入射和反射光的损失。