发明申请
- 专利标题： Polymer, resist composition and patterning process
- 专利标题（中）： 聚合物，抗蚀剂组合物和图案化工艺
-
申请号： US11345325申请日： 2006-02-02
-
公开(公告)号： US20060177765A1公开(公告)日： 2006-08-10
- 发明人: Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
- 申请人： Yuji Harada , Jun Hatakeyama , Yoshio Kawai , Masaru Sasago , Masayuki Endo , Kazuhiko Maeda , Haruhiko Komoriya , Michitaka Ootani
- 专利权人： Shin-Etsu Chemical Co., Ltd.,Matsushita Electric Industrial Co., Ltd.,Central Glass Co., Ltd.
- 当前专利权人： Shin-Etsu Chemical Co., Ltd.,Matsushita Electric Industrial Co., Ltd.,Central Glass Co., Ltd.
- 优先权： JP2005-028618 20050204
- 主分类号： G03C1/76
- IPC分类号： G03C1/76
摘要：
A fluorinated polymer comprising recurring units of formulae (1a) to (1d) and having a Mw of 1,000-500,000 is provided. R1 is an acid labile group, R2 is a single bond or methylene, a1, a2, a3, and a4 are numbers from more than 0 to less than 1, and 0
公开/授权文献
- US07378218B2 Polymer, resist composition and patterning process 公开/授权日：2008-05-27
信息查询
