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发明申请
US20060196425A1 Reflectors, substrate processing apparatuses and methods for the same 审中-公开
反射器，基板处理装置及其方法

Reflectors, substrate processing apparatuses and methods for the same
摘要：
A substrate processing apparatus may include a processing chamber including a plasma generating unit arranged in an upper region thereof. A grid system, which may extract ions from plasma formed by the plasma generating unit and may accelerate the ions to have substantially uniform directivity. The grid system may be positioned below the plasma generating unit. A reflector may be arranged below the grid system and may include parallel reflecting plates for converting the ions accelerated from the grid system into neutral beams.
摘要（中）：

基板处理装置可以包括处理室，其包括布置在其上部区域中的等离子体产生单元。 栅格系统，其可以从由等离子体发生单元形成的等离子体提取离子，并且可以加速离子以具有基本均匀的方向性。 栅格系统可以位于等离子体生成单元的下方。 反射器可以布置在栅格系统下方，并且可以包括用于将从栅格系统加速的离子转换成中性光束的平行反射板。

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