发明申请
US20060196603A1 Gas baffle and distributor for semiconductor processing chamber
有权
用于半导体处理室的气体挡板和分配器
- 专利标题： Gas baffle and distributor for semiconductor processing chamber
- 专利标题（中）： 用于半导体处理室的气体挡板和分配器
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申请号： US11075527申请日： 2005-03-07
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公开(公告)号： US20060196603A1公开(公告)日： 2006-09-07
- 发明人: Lawrence Lei , Siqing Lu , Steven Gianoulakis , Won Bang , David Sun , Yen-Kun Victor Wang
- 申请人： Lawrence Lei , Siqing Lu , Steven Gianoulakis , Won Bang , David Sun , Yen-Kun Victor Wang
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： C23F1/00
- IPC分类号： C23F1/00 ; C23C16/00 ; H01L21/306
摘要：
Techniques of the present invention are directed to distribution of deposition gases onto a substrate. In one embodiment, a gas distributor for use in a processing chamber is provided. The gas distributor includes a body having a gas deflecting surface and a gas distributor face. The gas deflecting surface defines a cleaning gas pathway. The gas distributor face is disposed on an opposite side of the body from the gas deflecting surface and faces toward a substrate support member. The gas distributor face includes a raised step and at least one set of apertures through the raised step. The at least one set of apertures are adapted to distribute a deposition gas over a substrate positioned on the substrate support member.
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