发明申请
US20060209313A1 Lithographic apparatus and device manufacturing method using repeated patterns in an LCD to reduce datapath volume
有权
平版印刷设备和设备制造方法，使用LCD中的重复图案来减少数据路径的体积
- 专利标题： Lithographic apparatus and device manufacturing method using repeated patterns in an LCD to reduce datapath volume
- 专利标题（中）： 平版印刷设备和设备制造方法，使用LCD中的重复图案来减少数据路径的体积
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申请号： US11084866申请日： 2005-03-21
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公开(公告)号： US20060209313A1公开(公告)日： 2006-09-21
- 发明人: Theodorus Van Den Akker , Martinus Hendricus Hoeks , Pieter De Jager , Lambertus Kessels , Marco Martinus Van Hassel , Frank Morselt
- 申请人： Theodorus Van Den Akker , Martinus Hendricus Hoeks , Pieter De Jager , Lambertus Kessels , Marco Martinus Van Hassel , Frank Morselt
- 申请人地址： NL Veldhoven
- 专利权人： ASML NetherlandS B.V.
- 当前专利权人： ASML NetherlandS B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： G06F3/12
- IPC分类号： G06F3/12
摘要：
A method and device for programming an array of individually controllable elements configured to impart a beam with a pattern. For example, the method can be suitable for use in a lithographic apparatus. The method comprises generating first data representing a first pattern, generating second data representing a second pattern, writing the first data to a first buffer, and reading the first data from the first buffer to program the array of individually controllable elements to display the first pattern, while writing the second data to a second buffer in parallel.
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