发明申请
- 专利标题: Semiconductor device and method of manufacturing the same
- 专利标题(中): 半导体装置及其制造方法
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申请号: US11392802申请日: 2006-03-28
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公开(公告)号: US20060220178A1公开(公告)日: 2006-10-05
- 发明人: Hirotoshi Kubo , Yukari Shirahata , Shigehito Matsumoto , Masamichi Yamamuro , Koujiro Kameyama , Mitsuo Umemoto
- 申请人: Hirotoshi Kubo , Yukari Shirahata , Shigehito Matsumoto , Masamichi Yamamuro , Koujiro Kameyama , Mitsuo Umemoto
- 优先权: JPP2005-097602 20050330; JPP2005-252184 20050831
- 主分类号: H01L29/00
- IPC分类号: H01L29/00
摘要:
Disclosed is a semiconductor device in which emitter pad electrodes connected to an active region, collector and base pad electrodes are formed on a surface of a semiconductor substrate. Furthermore, on a back surface of the semiconductor substrate, a backside electrode is formed. Moreover, the emitter pad electrodes connected to a grounding potential are connected to the backside electrode through feedthrough electrodes penetrating the semiconductor substrate in a thickness direction.
公开/授权文献
- US07397128B2 Semiconductor device and method of manufacturing the same 公开/授权日:2008-07-08
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