发明申请
- 专利标题: Method for fabricating an electrical component
- 专利标题(中): 电气部件的制造方法
-
申请号: US11399811申请日: 2006-04-07
-
公开(公告)号: US20060234463A1公开(公告)日: 2006-10-19
- 发明人: Alejandro Avellan , Thomas Hecht , Stefan Jakschik , Uwe Schroeder
- 申请人: Alejandro Avellan , Thomas Hecht , Stefan Jakschik , Uwe Schroeder
- 优先权: DE102005018029.9 20050414
- 主分类号: H01L21/20
- IPC分类号: H01L21/20 ; H01L21/8242 ; H01L21/31 ; H01L21/469
摘要:
An electrical component, such as a DRAM semiconductor memory or a field-effect transistor is fabricated. At least one capacitor having a dielectric (130) and at least one connection electrode (120, 140) are fabricated. To enable the capacitors fabricated to have optimum storage properties even for very small capacitor structures, the dielectric (130) or the connection electrode (120, 140) are formed in such a manner that transient polarization effects are prevented or at least reduced.
公开/授权文献
- US07531406B2 Method for fabricating an electrical component 公开/授权日:2009-05-12
信息查询
IPC分类: