发明申请
- 专利标题: Apparatus and method for photomask design
- 专利标题(中): 光掩模设计的设备和方法
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申请号: US11203330申请日: 2005-08-13
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公开(公告)号: US20060248498A1公开(公告)日: 2006-11-02
- 发明人: Abdurrahman Sezginer , Roy Prasad , Chi-Song Horng , Hsu-Ting Huang
- 申请人: Abdurrahman Sezginer , Roy Prasad , Chi-Song Horng , Hsu-Ting Huang
- 申请人地址: US CA San Jose
- 专利权人: Invarium, Inc.
- 当前专利权人: Invarium, Inc.
- 当前专利权人地址: US CA San Jose
- 主分类号: G06F17/50
- IPC分类号: G06F17/50
摘要:
An apparatus and method of synthesizing a photolithographic data set includes using a first computational model to calculate a first figure-of-merit for the photolithographic data set; changing a first part of the photolithographic data set to increase the first figure-of-merit; and then using a second computational model to calculate a second figure-of-merit of the photolithographic data set; and changing a second part of the photolithographic data set to increase the second figure-of-merit. The second computational model enables figure-of-merit calculations to be executed at a significantly faster execution rate that the first computational model.
公开/授权文献
- US07743359B2 Apparatus and method for photomask design 公开/授权日:2010-06-22
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