- 专利标题: Processing system and method for chemically treating a tera layer
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申请号: US11486105申请日: 2006-07-14
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公开(公告)号: US20060254716A1公开(公告)日: 2006-11-16
- 发明人: Aelan Mosden , Asao Yamashita
- 申请人: Aelan Mosden , Asao Yamashita
- 申请人地址: JP Tokyo 107
- 专利权人: Tokyo Electron Limited
- 当前专利权人: Tokyo Electron Limited
- 当前专利权人地址: JP Tokyo 107
- 主分类号: C23F1/00
- IPC分类号: C23F1/00 ; H01L21/306 ; C23C16/00
摘要:
A processing system and method for chemically treating a TERA layer on a substrate. The chemical treatment of the substrate chemically alters exposed surfaces on the substrate. In one embodiment, the system for processing a TERA layer includes a plasma-enhanced chemical vapor deposition (PECVD) system for depositing the TERA layer on the substrate, an etching system for creating features in the TERA layer, and a processing subsystem for reducing the size of the features in the TERA layer.