Invention Application
- Patent Title: Semiconductor photodetector and method for manufacturing the same
- Patent Title (中): 半导体光电探测器及其制造方法
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Application No.: US11259196Application Date: 2005-10-27
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Publication No.: US20060273421A1Publication Date: 2006-12-07
- Inventor: Nami Yasuoka , Haruhiko Kuwatsuka , Toru Uchida , Yoshihiro Yoneda
- Applicant: Nami Yasuoka , Haruhiko Kuwatsuka , Toru Uchida , Yoshihiro Yoneda
- Applicant Address: JP Kawasaki JP Nakakoma-gun
- Assignee: FUJITSU LIMITED,EUDYNA DEVICES, INC.
- Current Assignee: FUJITSU LIMITED,EUDYNA DEVICES, INC.
- Current Assignee Address: JP Kawasaki JP Nakakoma-gun
- Priority: JP2005-162416 20050602
- Main IPC: H01L31/107
- IPC: H01L31/107

Abstract:
In order to improve reliability by preventing an edge breakdown in a semiconductor photodetector having a mesa structure such as a mesa APD, the semiconductor photodetector comprises a mesa structure formed on a first semiconductor layer of the first conduction type formed on a semiconductor substrate, the mesa structure including a light absorbing layer for absorbing light, an electric field buffer layer for dropping an electric field intensity, an avalanche multiplication layer for causing avalanche multiplication to occur, and a second semiconductor layer of the second conduction type, wherein the thickness of the avalanche multiplication layer at the portion in the vicinity of the side face of the mesa structure is made thinner than the thickness at the central portion of the mesa structure.
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Information query
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