发明申请
- 专利标题: Method of qualifying a diffraction grating and method of manufacturing an optical element
- 专利标题(中): 限定衍射光栅的方法和制造光学元件的方法
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申请号: US11439719申请日: 2006-05-23
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公开(公告)号: US20060274325A1公开(公告)日: 2006-12-07
- 发明人: Jochen Hetzler , Ulrich Andiel , Hartmut Brandenburg
- 申请人: Jochen Hetzler , Ulrich Andiel , Hartmut Brandenburg
- 申请人地址: DE Oberkochen
- 专利权人: Carl Zeiss SMT AG
- 当前专利权人: Carl Zeiss SMT AG
- 当前专利权人地址: DE Oberkochen
- 主分类号: G01B9/02
- IPC分类号: G01B9/02
摘要:
A method of qualifying a diffraction grating comprises performing plural measurements by illuminating a region of the grating with a beam of measuring light and detecting an intensity of measuring light diffracted by the grating into a 0th diffraction order. A wavelength of the measuring light or a polarization of the measuring light or an angle of incidence of the measuring light onto the diffraction grating is varied between subsequent measurements. A shape parameter of diffracting elements forming the grating comprises a pitch, height or width of structural features of the diffracting elements. The shape parameter is advantageously used in analyzing interferometric measurements performed on optical surfaces during manufacture of optical elements of a high accuracy.