公开(公告)号：US20060274325A1

公开(公告)日：2006-12-07

申请号：US11439719

申请日：2006-05-23

申请人： Jochen Hetzler ,  Ulrich Andiel ,  Hartmut Brandenburg

发明人： Jochen Hetzler ,  Ulrich Andiel ,  Hartmut Brandenburg

IPC分类号： G01B9/02

CPC分类号： G02B5/1861 ,  G01B9/02039 ,  G01B9/02057 ,  G01B11/2441 ,  G01B2290/70 ,  G02B27/0944 ,  G02B27/42 ,  G02B27/4233

摘要： A method of qualifying a diffraction grating comprises performing plural measurements by illuminating a region of the grating with a beam of measuring light and detecting an intensity of measuring light diffracted by the grating into a 0th diffraction order. A wavelength of the measuring light or a polarization of the measuring light or an angle of incidence of the measuring light onto the diffraction grating is varied between subsequent measurements. A shape parameter of diffracting elements forming the grating comprises a pitch, height or width of structural features of the diffracting elements. The shape parameter is advantageously used in analyzing interferometric measurements performed on optical surfaces during manufacture of optical elements of a high accuracy.

摘要翻译： 限定衍射光栅的方法包括通过用测量光束照射光栅的区域并且将由光栅衍射的测量光的强度检测为第0衍射级来执行多个测量。 测量光的波长或测量光的偏振或测量光入射到衍射光栅上的入射角在随后的测量之间变化。 形成光栅的衍射元件的形状参数包括衍射元件的结构特征的节距，高度或宽度。 形状参数有利地用于分析在高精度的光学元件的制造期间在光学表面上执行的干涉测量。

公开(公告)号：US20080316500A1

公开(公告)日：2008-12-25

申请号：US12216106

申请日：2008-06-30

申请人： Stefan Schulte ,  Ulrich Andiel

发明人： Stefan Schulte ,  Ulrich Andiel

IPC分类号： G01B9/02 ,  B29D11/00

CPC分类号： G01B9/02039 ,  G01B9/02057 ,  G01B11/2441 ,  G01B2290/20 ,  G01M11/0264 ,  G01M11/0271

摘要： A method of manufacturing an optical element having an optical surface of a non-rotationally symmetric shape is described. Measuring light is generated using an interferometer optics, wherein the interferometer optics has at least one diffractive component having a grating. The optical surface is positioned at a first position relative to the diffractive component, wherein first measuring light diffracted at the diffractive component is incident on the optical surface at plural locations thereof, and at least one first interference pattern generated from first measuring light reflected from the optical surface is detected. The optical surface is positioned at a second position relative to the at least one diffractive component, wherein second measuring light diffracted at the diffractive component is incident on the optical surface at plural locations thereof, and at least one second interference pattern generated from second measuring light reflected from the optical surface is detected.

摘要翻译： 描述了具有非旋转对称形状的光学表面的光学元件的制造方法。 使用干涉仪光学器件生成测量光，其中干涉仪光学器件具有至少一个具有光栅的衍射元件。 光学表面位于相对于衍射部件的第一位置处，其中在衍射部件处衍射的第一测量光在其多个位置处入射到光学表面上，并且从第一测量光产生的至少一个第一干涉图案从 检测光学表面。 光学表面位于相对于至少一个衍射部件的第二位置，其中在衍射部件处衍射的第二测量光在其多个位置处入射到光学表面上，并且从第二测量光产生的至少一个第二干涉图案 检测从光学表面反射的光。

公开(公告)号：US07602502B2

公开(公告)日：2009-10-13

申请号：US12216106

申请日：2008-06-30

申请人： Stefan Schulte ,  Ulrich Andiel

发明人： Stefan Schulte ,  Ulrich Andiel

IPC分类号： G01B11/02

CPC分类号： G01B9/02039 ,  G01B9/02057 ,  G01B11/2441 ,  G01B2290/20 ,  G01M11/0264 ,  G01M11/0271

摘要： A method of manufacturing an optical element having an optical surface of a non-rotationally symmetric shape is described. Measuring light is generated using an interferometer optics, wherein the interferometer optics has at least one diffractive component having a grating. The optical surface is positioned at a first position relative to the diffractive component, wherein first measuring light diffracted at the diffractive component is incident on the optical surface at plural locations thereof, and at least one first interference pattern generated from first measuring light reflected from the optical surface is detected. The optical surface is positioned at a second position relative to the at least one diffractive component, wherein second measuring light diffracted at the diffractive component is incident on the optical surface at plural locations thereof, and at least one second interference pattern generated from second measuring light reflected from the optical surface is detected.

摘要翻译： 描述了具有非旋转对称形状的光学表面的光学元件的制造方法。 使用干涉仪光学器件生成测量光，其中干涉仪光学器件具有至少一个具有光栅的衍射元件。 光学表面位于相对于衍射部件的第一位置处，其中在衍射部件处衍射的第一测量光在其多个位置处入射到光学表面上，并且从第一测量光产生的至少一个第一干涉图案从 检测光学表面。 光学表面位于相对于至少一个衍射部件的第二位置，其中在衍射部件处衍射的第二测量光在其多个位置处入射到光学表面上，并且从第二测量光产生的至少一个第二干涉图案 检测从光学表面反射的光。

公开(公告)号：US07919004B2

公开(公告)日：2011-04-05

申请号：US12534659

申请日：2009-08-03

申请人： Martin Weiser ,  Olaf Bork ,  Ulrich Andiel

发明人： Martin Weiser ,  Olaf Bork ,  Ulrich Andiel

IPC分类号： B29D11/00

CPC分类号： G02B5/0825 ,  C23F4/00 ,  G02B5/0891 ,  G03F1/24 ,  G03F1/72

摘要： A method for removing at least one reflective layer (4a, 4b) from an optical element (1) for EUV lithography, wherein the optical element (1) has a substrate (2) and an interlayer (6) between the substrate (2) and the at least one reflective layer (4a, 4b). The method includes etching away the at least one reflective layer (4a, 4b) as far as the interlayer (6) with an etching gas (7), wherein the material of the interlayer (6) does not react with the etching gas (7), and wherein, after the etching away, the interlayer (6) has a surface roughness of less than 0.5 nm rms, preferably of less than 0.2 nm rms, and more preferably of less than 0.1 nm rms. Also, an optical element (1) for reflecting radiation in the EUV wavelength range includes a substrate (2), at least one reflective layer (4a, 4b), and an interlayer (6) arranged between the substrate (2) and the at least one reflective layer (4a, 4b). The interlayer (6) is composed at least partly of a material which does not react with a halogen or a halogen compound as etching gas (7) and which is selected, in particular, from one or more of the following: alkali metal halides, alkaline earth metal halides and aluminum oxide (Al2O3). The interlayer (6) has a surface roughness of less than 0.5 nm rms, preferably of less than 0.2 nm rms, and more preferably of less than 0.1 nm rms.

摘要翻译： 一种用于从用于EUV光刻的光学元件（1）去除至少一个反射层（4a，4b）的方法，其中所述光学元件（1）在所述基板（2）之间具有基板（2）和中间层（6） 和所述至少一个反射层（4a，4b）。 该方法包括使用蚀刻气体（7）将至少一个反射层（4a，4b）蚀刻掉至中间层（6），其中中间层（6）的材料不与蚀刻气体（7）反应 ），并且其中在蚀刻之后，中间层（6）具有小于0.5nm rms，优选小于0.2nm rms，更优选小于0.1nm rms的表面粗糙度。 此外，用于反射EUV波长范围的辐射的光学元件（1）包括基板（2），至少一个反射层（4a，4b）和布置在基板（2）和基板 至少一个反射层（4a，4b）。 中间层（6）至少部分由不与卤素或卤素化合物作为蚀刻气体（7）反应的材料组成，特别是选自以下的一种或多种：碱金属卤化物， 碱土金属卤化物和氧化铝（Al2O3）。 中间层（6）具有小于0.5nm rms，优选小于0.2nm rms，更优选小于0.1nm rms的表面粗糙度。

公开(公告)号：US20100027106A1

公开(公告)日：2010-02-04

申请号：US12534659

申请日：2009-08-03

申请人： Martin WEISER ,  Olaf Bork ,  Ulrich Andiel

发明人： Martin WEISER ,  Olaf Bork ,  Ulrich Andiel

IPC分类号： G02B5/08 ,  B29D11/00

CPC分类号： G02B5/0825 ,  C23F4/00 ,  G02B5/0891 ,  G03F1/24 ,  G03F1/72

摘要： A method for removing at least one reflective layer (4a, 4b) from an optical element (1) for EUV lithography, wherein the optical element (1) has a substrate (2) and an interlayer (6) between the substrate (2) and the at least one reflective layer (4a, 4b). The method includes etching away the at least one reflective layer (4a, 4b) as far as the interlayer (6) with an etching gas (7), wherein the material of the interlayer (6) does not react with the etching gas (7), and wherein, after the etching away, the interlayer (6) has a surface roughness of less than 0.5 nm rms, preferably of less than 0.2 nm rms, and more preferably of less than 0.1 nm rms. Also, an optical element (1) for reflecting radiation in the EUV wavelength range includes a substrate (2), at least one reflective layer (4a, 4b), and an interlayer (6) arranged between the substrate (2) and the at least one reflective layer (4a, 4b). The interlayer (6) is composed at least partly of a material which does not react with a halogen or a halogen compound as etching gas (7) and which is selected, in particular, from one or more of the following: alkali metal halides, alkaline earth metal halides and aluminum oxide (Al2O3). The interlayer (6) has a surface roughness of less than 0.5 nm rms, preferably of less than 0.2 nm rms, and more preferably of less than 0.1 nm rms.

摘要翻译： 一种用于从用于EUV光刻的光学元件（1）去除至少一个反射层（4a，4b）的方法，其中所述光学元件（1）在所述基板（2）之间具有基板（2）和中间层（6） 和所述至少一个反射层（4a，4b）。 该方法包括使用蚀刻气体（7）将至少一个反射层（4a，4b）蚀刻掉至中间层（6），其中中间层（6）的材料不与蚀刻气体（7）反应 ），并且其中在蚀刻之后，中间层（6）具有小于0.5nm rms，优选小于0.2nm rms，更优选小于0.1nm rms的表面粗糙度。 此外，用于反射EUV波长范围的辐射的光学元件（1）包括基板（2），至少一个反射层（4a，4b）和布置在基板（2）和基板 至少一个反射层（4a，4b）。 中间层（6）至少部分由不与卤素或卤素化合物作为蚀刻气体（7）反应的材料组成，特别是选自以下的一种或多种：碱金属卤化物， 碱土金属卤化物和氧化铝（Al2O3）。 中间层（6）具有小于0.5nm rms，优选小于0.2nm rms，更优选小于0.1nm rms的表面粗糙度。