Invention Application
- Patent Title: RETICLE-MASKING OBJECTIVE WITH ASPHERICAL LENSES
- Patent Title (中): 隐形眼镜的隐藏目标
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Application No.: US11534022Application Date: 2006-09-21
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Publication No.: US20070014028A1Publication Date: 2007-01-18
- Inventor: Johannes Wangler , Karl-Heinz Schuster , Alexander Sohmer , Alexander Epple , Jurgen Grunwald , Jorg Schultz , Christa Muller
- Applicant: Johannes Wangler , Karl-Heinz Schuster , Alexander Sohmer , Alexander Epple , Jurgen Grunwald , Jorg Schultz , Christa Muller
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT AG
- Current Assignee: Carl Zeiss SMT AG
- Current Assignee Address: DE Oberkochen
- Priority: DE19653983.8 19961212; DE10108677.6 20010223
- Main IPC: G02B21/02
- IPC: G02B21/02
Abstract:
A reticle-masking (REMA) objective for imaging an object plane onto an image plane has a condenser portion, an intermediate portion, and a field lens portion. The three portions together have no more than 10 lenses with a combined total of no more than five aspheric lens surfaces. Each of the three portions of the REMA objective has one or two aspheric lens surfaces.
Public/Granted literature
- US07372634B2 Reticle-masking objective with aspherical lenses Public/Granted day:2008-05-13
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