发明申请
- 专利标题: Apparatus and method for removing a photoresist structure from a substrate
- 专利标题(中): 从基板去除光致抗蚀剂结构的设备和方法
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申请号: US11488706申请日: 2006-07-19
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公开(公告)号: US20070020943A1公开(公告)日: 2007-01-25
- 发明人: In-Gi Kim , In-Seak Hwang , Dae-Hyuk Chung , Kyoung-Hwan Kim
- 申请人: In-Gi Kim , In-Seak Hwang , Dae-Hyuk Chung , Kyoung-Hwan Kim
- 优先权: KR2005-66374 20050721
- 主分类号: H01L21/306
- IPC分类号: H01L21/306 ; H01L21/302
摘要:
In an apparatus and method for removing a photoresist structure from a substrate, a chamber for receiving the substrate includes a showerhead for uniformly distributing a mixture of water vapor and ozone gas onto the substrate. The showerhead includes a first space having walls and configured to receive the water vapor, and a second space connected to the first space so that the water vapor is supplied to and partially condensed into liquid water on one or more walls of the first space. Ozone gas and water vapor without liquid water may be supplied to the second space to form the mixture therein. The showerhead may be heated to vaporize the liquid water on a given surface of the first space.