发明申请
- 专利标题： Test mask for optical and electron optical systems.
- 专利标题（中）： 光学和电子光学系统的测试掩模。
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申请号： US11424500申请日： 2006-06-15
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公开(公告)号： US20070031739A1公开(公告)日： 2007-02-08
- 发明人: Walter Steinberg , Gerhard Schlueter , Michael Ferber
- 申请人： Walter Steinberg , Gerhard Schlueter , Michael Ferber
- 申请人地址： DE Wetzlar
- 专利权人： Vistec Semiconductor Systems GmbH
- 当前专利权人： Vistec Semiconductor Systems GmbH
- 当前专利权人地址： DE Wetzlar
- 主分类号： G03F1/00
- IPC分类号： G03F1/00
摘要：
A test mask 1 for microscopy is disclosed, which is formed on a substrate of quartz. The test mask 1 comprises a multiplicity of sub-masks 4, which are implemented such that each sub-mask 4 comprises structures which differ within a sub-mask 4 with regard to form and size. In addition, the structures of the individual sub-masks 4 are designed for optical or particle optical measurements according to size.
公开/授权文献
- US07416819B2 Test mask for optical and electron optical systems 公开/授权日：2008-08-26