发明申请
- 专利标题： Thermal management of inductively coupled plasma reactors
- 专利标题（中）： 电感耦合等离子体反应器的热管理
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申请号： US11200431申请日： 2005-08-09
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公开(公告)号： US20070034153A1公开(公告)日： 2007-02-15
- 发明人: Siqing Lu , Qiwei Liang , Irene Chou , Steven Kim , Young Lee , Ellie Yieh , Muhammad Rasheed
- 申请人： Siqing Lu , Qiwei Liang , Irene Chou , Steven Kim , Young Lee , Ellie Yieh , Muhammad Rasheed
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 主分类号： H01L21/306
- IPC分类号： H01L21/306 ; C23C16/00
摘要：
An RF coil assembly provides a source to generate a plasma inductively in a process chamber. The RF coil assembly includes an RF coil disposed about a perimeter of the processing chamber and a frame disposed about a perimeter of the processing chamber. The frame is adapted to support the RF coil in position. An interface material is disposed between and in thermal contact with the frame and a sidewall of the processing chamber. The interface material has a thermal conductivity of 4.0 W/mK or greater.
公开/授权文献
- US07811411B2 Thermal management of inductively coupled plasma reactors 公开/授权日：2010-10-12
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