Invention Application
US20070048790A1 Device for measuring nanometer level pattern-dependent binding reactions
失效
用于测量纳米级模式依赖性结合反应的装置
- Patent Title: Device for measuring nanometer level pattern-dependent binding reactions
- Patent Title (中): 用于测量纳米级模式依赖性结合反应的装置
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Application No.: US11404716Application Date: 2006-04-13
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Publication No.: US20070048790A1Publication Date: 2007-03-01
- Inventor: Michael Sheetz , Samuel Wind
- Applicant: Michael Sheetz , Samuel Wind
- Applicant Address: US NY New York
- Assignee: THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK
- Current Assignee: THE TRUSTEES OF COLUMBIA UNIVERSITY IN THE CITY OF NEW YORK
- Current Assignee Address: US NY New York
- Main IPC: G01N33/53
- IPC: G01N33/53 ; C12M3/00
Abstract:
The present invention is directed to a device comprising (a) a substrate having a surface and (b) an ordered array of posts over the surface, wherein the posts are capable of binding a protein or small molecule ligand, and wherein the pitch between adjacent posts is less than about 100 nm. The invention is also directed to methods for identifying the presence of an analyte in a fluid and to methods for measuring relative binding specificity or affinity between an analyte in a fluid and the posts, using the device of the present invention.
Public/Granted literature
- US08476065B2 Device for measuring nanometer level pattern-dependent binding reactions Public/Granted day:2013-07-02
Information query
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