发明申请
- 专利标题: Methods of Fabricating Semiconductor Devices with Enlarged Recessed Gate Electrodes
- 专利标题(中): 制造具有放大栅极电极的半导体器件的方法
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申请号: US11556352申请日: 2006-11-03
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公开(公告)号: US20070057288A1公开(公告)日: 2007-03-15
- 发明人: Seong-Ho Kim , Chang-Sub Lee , Jeong-Dong Choe , Sung-Min Kim , Shin-Ae Lee , Dong-Gun Park
- 申请人: Seong-Ho Kim , Chang-Sub Lee , Jeong-Dong Choe , Sung-Min Kim , Shin-Ae Lee , Dong-Gun Park
- 专利权人: Samsung Electronics., Ltd.
- 当前专利权人: Samsung Electronics., Ltd.
- 优先权: KR2002-81091 20021218
- 主分类号: H01L31/00
- IPC分类号: H01L31/00
摘要:
A semiconductor device includes a semiconductor substrate having a recess therein. A gate insulator is disposed on the substrate in the recess. The device further includes a gate electrode including a first portion on the gate insulator in the recess and a second reduced-width portion extending from the first portion. A source/drain region is disposed in the substrate adjacent the recess. The recess may have a curved shape, e.g., may have hemispherical or ellipsoid shape. The source/drain region may include a lighter-doped portion adjoining the recess. Relate fabrication methods are also discussed.
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