发明申请
- 专利标题: Electrostatic deflection system with low aberrations and vertical beam incidence
- 专利标题(中): 具有低像差和垂直光束入射的静电偏转系统
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申请号: US11241880申请日: 2005-09-30
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公开(公告)号: US20070075262A1公开(公告)日: 2007-04-05
- 发明人: Dieter Winkler , Henry Pearce-Percy , Juergen Frosien , William Devore
- 申请人: Dieter Winkler , Henry Pearce-Percy , Juergen Frosien , William Devore
- 专利权人: APPLIED MATERIALS, INC.
- 当前专利权人: APPLIED MATERIALS, INC.
- 主分类号: H01J37/147
- IPC分类号: H01J37/147
摘要:
Embodiments of the present invention may be utilized to improve electron beam deflection. One embodiment provides an electrostatic deflection system with electrodes that minimize aberrations and to achieve vertical incidence simultaneously. By using at least two stages of deflection for a deflection direction, the present invention allows the deflected electron beam to pass a back focal plane of an objective lens while deflection capacitors are not disposed across the back focal plane. As a result, deflection electrodes can have an angle of 120° to minimize aberrations and simultaneously achieve vertical incidence of the electron beam on a target to avoid distortions or changes in magnification with height variations of the target or focus variations.
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