Electrostatic deflection system with low aberrations and vertical beam incidence
    1.
    发明申请
    Electrostatic deflection system with low aberrations and vertical beam incidence 有权
    具有低像差和垂直光束入射的静电偏转系统

    公开(公告)号:US20070075262A1

    公开(公告)日:2007-04-05

    申请号:US11241880

    申请日:2005-09-30

    IPC分类号: H01J37/147

    摘要: Embodiments of the present invention may be utilized to improve electron beam deflection. One embodiment provides an electrostatic deflection system with electrodes that minimize aberrations and to achieve vertical incidence simultaneously. By using at least two stages of deflection for a deflection direction, the present invention allows the deflected electron beam to pass a back focal plane of an objective lens while deflection capacitors are not disposed across the back focal plane. As a result, deflection electrodes can have an angle of 120° to minimize aberrations and simultaneously achieve vertical incidence of the electron beam on a target to avoid distortions or changes in magnification with height variations of the target or focus variations.

    摘要翻译: 本发明的实施例可用于改善电子束偏转。 一个实施例提供一种静电偏转系统,其具有最小化像差并且同时实现垂直入射的电极。 通过对偏转方向使用至少两个偏转级,本发明允许偏转的电子束通过物镜的后焦平面,而偏转电容器不跨过后焦平面设置。 结果,偏转电极可以具有120°的角度以最小化像差并且同时实现电子束在靶上的垂直入射,以避免目标或焦点变化的高度变化引起的变形或放大变化。

    Electron beam source for use in electron gun
    4.
    发明申请
    Electron beam source for use in electron gun 有权
    用于电子枪的电子束源

    公开(公告)号:US20070057617A1

    公开(公告)日:2007-03-15

    申请号:US11286802

    申请日:2005-11-22

    IPC分类号: H01J29/46 H01J29/50

    摘要: An electron beam source for use in an electron gun. The electron beam source includes an emitter terminating in a tip. The emitter is configured to generate an electron beam. The electron beam source further includes a suppressor electrode laterally surrounding the emitter such that the tip of the emitter protrudes through the suppressor electrode and an extractor electrode disposed adjacent the tip of the emitter. The extractor electrode comprises a magnetic disk whose magnetic field is aligned with an axis of the electron beam.

    摘要翻译: 一种用于电子枪的电子束源。 电子束源包括终端在尖端中的发射器。 发射极被配置为产生电子束。 电子束源还包括横向围绕发射器的抑制电极,使得发射极的尖端突出通过抑制电极和与发射极的顶端相邻设置的提取电极。 提取器电极包括其磁场与电子束的轴线对齐的磁盘。

    Raster scan gaussian beam writing strategy and method for pattern generation
    5.
    发明授权
    Raster scan gaussian beam writing strategy and method for pattern generation 失效
    光栅扫描高斯光束写入策略和图案生成方法

    公开(公告)号:US06274290B1

    公开(公告)日:2001-08-14

    申请号:US09179361

    申请日:1998-10-26

    IPC分类号: G03C500

    摘要: A hybrid exposure strategy for pattern generation uses wide field raster scan deflection and a uniformly moving stage to expose long stripes. Periodic analog wide field magnetic scan is augmented by a high speed electrostatic retrograde scan to keep the beam essentially stationary during exposure of rectangular flash fields and/or Gaussian beams. In this manner a staircase deflection trajectory is created for the beam. The position and dose data for each flash is derived from a rasterized data format using a decoder device.

    摘要翻译: 用于图案生成的混合曝光策略使用宽场光栅扫描偏转和均匀移动的阶段来暴露长条纹。 通过高速静电逆行扫描来增加定期的模拟广域磁扫描,以在矩形闪光场和/或高斯光束的曝光期间保持光束基本静止。 以这种方式,为梁形成了阶梯偏转轨迹。 每个闪存的位置和剂量数据都是从使用解码器设备的光栅化数据格式导出的。