发明申请
US20070076850A1 Antiscattering grid and a method of manufacturing such a grid
审中-公开
反散射网格和制造这样的网格的方法
- 专利标题: Antiscattering grid and a method of manufacturing such a grid
- 专利标题(中): 反散射网格和制造这样的网格的方法
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申请号: US11599796申请日: 2006-11-15
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公开(公告)号: US20070076850A1公开(公告)日: 2007-04-05
- 发明人: Henri Souchay , Remy Klausz , Guillaume Bacher , Bruno Richou
- 申请人: Henri Souchay , Remy Klausz , Guillaume Bacher , Bruno Richou
- 优先权: FR0113357 20011017
- 主分类号: G21K1/00
- IPC分类号: G21K1/00
摘要:
An antiscattering grid for an X-ray imaging apparatus of the type comprising a substrate having a plurality of metallized partitions which together define a plurality of cells distributed over the substrate. The partitions allow passage of the X-rays emitted from a source lying in line with the grid, and absorbing the X-rays not coming directly from this source. The substrate is made of a polymer material that may be formed by radiation curing of a monomer sensitive to this radiation. The substrate may be substantially planar and the partitions may be oriented to form a focused grid.
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