Antiscattering grid and a method of manufacturing such a grid
    1.
    发明申请
    Antiscattering grid and a method of manufacturing such a grid 审中-公开
    反散射网格和制造这样的网格的方法

    公开(公告)号:US20070076850A1

    公开(公告)日:2007-04-05

    申请号:US11599796

    申请日:2006-11-15

    IPC分类号: G21K1/00

    CPC分类号: G21K1/025 B33Y80/00

    摘要: An antiscattering grid for an X-ray imaging apparatus of the type comprising a substrate having a plurality of metallized partitions which together define a plurality of cells distributed over the substrate. The partitions allow passage of the X-rays emitted from a source lying in line with the grid, and absorbing the X-rays not coming directly from this source. The substrate is made of a polymer material that may be formed by radiation curing of a monomer sensitive to this radiation. The substrate may be substantially planar and the partitions may be oriented to form a focused grid.

    摘要翻译: 用于这种类型的X射线成像设备的反散射网格,包括具有多个金属化隔板的基板,所述多个金属化隔板共同限定分布在基板上的多个单元。 分区允许从与栅格成一直线的源发射的X射线通过,并吸收不直接从该源发出的X射线。 该基底由聚合物材料制成,该材料可通过对该辐射敏感的单体的辐射固化而形成。 衬底可以是基本上平面的,并且分隔件可以被定向成形成聚焦栅格。