发明申请
US20070085152A1 Reduced area dynamic random access memory (DRAM) cell and method for fabricating the same
审中-公开
减小区动态随机存取存储器(DRAM)单元及其制造方法
- 专利标题: Reduced area dynamic random access memory (DRAM) cell and method for fabricating the same
- 专利标题(中): 减小区动态随机存取存储器(DRAM)单元及其制造方法
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申请号: US11250822申请日: 2005-10-14
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公开(公告)号: US20070085152A1公开(公告)日: 2007-04-19
- 发明人: Douglas Butler , Chia-Shun Hsiao , Jung-Wu Chien , Chih-Hsun Chu
- 申请人: Douglas Butler , Chia-Shun Hsiao , Jung-Wu Chien , Chih-Hsun Chu
- 专利权人: ProMOS Technologies PTE.LTD. Singapore
- 当前专利权人: ProMOS Technologies PTE.LTD. Singapore
- 主分类号: H01L29/76
- IPC分类号: H01L29/76
摘要:
A reduced area dynamic random access memory (DRAM) cell and method for fabricating the same wherein the cell occupies an area smaller than one photolithography pitch by two photolithography pitches through the formation of sidewall spacers along a first pattern to define a first portion of the active region of the memory cell and a second orthogonally oriented pattern to define a second portion of the active region of the memory cell thereby creating a ladder shaped active region for a column of the memory cells.
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