发明申请
- 专利标题： Phase-shifting masks with sub-wavelength diffractive optical elements
- 专利标题（中）： 具有亚波长衍射光学元件的相移掩模
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申请号： US11242165申请日： 2005-09-30
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公开(公告)号： US20070094959A1公开(公告)日： 2007-05-03
- 发明人: Bin Hu , Vivek Singh , Yan Borodovsky
- 申请人： Bin Hu , Vivek Singh , Yan Borodovsky
- 主分类号： E04C2/52
- IPC分类号： E04C2/52
摘要：
The present invention discloses a method of designing a set of two tiled masks, as well as, a mask including: a first tile, the first tile being transparent to a light, the first tile having a first characteristic linear dimension that is 15% or less of a wavelength of the light; a second tile, the second tile being transparent to the light, the second tile having a second characteristic linear dimension that is 15% or less of the wavelength of the light; and a third tile, the third tile being opaque to the light, the third tile having a third characteristic linear dimension that is 15% or less of the wavelength of the light.
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