Invention Application
US20070094959A1 Phase-shifting masks with sub-wavelength diffractive optical elements 有权
具有亚波长衍射光学元件的相移掩模

  • Patent Title: Phase-shifting masks with sub-wavelength diffractive optical elements
  • Patent Title (中): 具有亚波长衍射光学元件的相移掩模
  • Application No.: US11242165
    Application Date: 2005-09-30
  • Publication No.: US20070094959A1
    Publication Date: 2007-05-03
  • Inventor: Bin HuVivek SinghYan Borodovsky
  • Applicant: Bin HuVivek SinghYan Borodovsky
  • Main IPC: E04C2/52
  • IPC: E04C2/52
Phase-shifting masks with sub-wavelength diffractive optical elements
Abstract:
The present invention discloses a method of designing a set of two tiled masks, as well as, a mask including: a first tile, the first tile being transparent to a light, the first tile having a first characteristic linear dimension that is 15% or less of a wavelength of the light; a second tile, the second tile being transparent to the light, the second tile having a second characteristic linear dimension that is 15% or less of the wavelength of the light; and a third tile, the third tile being opaque to the light, the third tile having a third characteristic linear dimension that is 15% or less of the wavelength of the light.
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