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    ALLOY COMPOSITION
    2.
    发明申请
    ALLOY COMPOSITION 审中-公开

    公开(公告)号：US20180057913A1

    公开(公告)日：2018-03-01

    申请号：US15557001

    申请日：2015-03-19

    Applicant: Bin Hu ,  GM GLOBAL TECHNOLOGY OPERATIONS LLC

    Inventor： Bin HU

    IPC: C22C21/02 ,  B22D17/00

    CPC classification number: C22C21/02 ,  B22D17/00 ,  C22F1/043

    Abstract: An alloy composition includes from about 4 wt % to about 11 wt % of silicon based on a total wt % of the alloy composition; from about 0.1 wt % to about 0.5 wt % of chromium based on the total wt % of the alloy composition; from about 0.1 wt % to about 0.5 wt % of magnesium based on the total wt % of the alloy composition; from about 0.01 wt % to about 0.05 wt % of titanium based on the total wt % of the alloy composition; equal to or less than 0.5 wt % of iron based on the total wt % of the alloy composition; equal to or less than 0.5 wt % of manganese based on the total wt % of the alloy composition; and a balance of aluminum.

    Detection apparatus
    7.
    发明授权
    Detection apparatus 有权
    检测装置

    公开(公告)号：US09037342B2

    公开(公告)日：2015-05-19

    申请号：US12428191

    申请日：2009-04-22

    Applicant: Junping Shi ,  Shangmin Sun ,  Jinning Liang ,  Quanwei Song ,  Yucheng Wu ,  Bin Hu ,  Yanjun Han ,  Xuejing Yang

    Inventor： Junping Shi ,  Shangmin Sun ,  Jinning Liang ,  Quanwei Song ,  Yucheng Wu ,  Bin Hu ,  Yanjun Han ,  Xuejing Yang

    IPC: G01V5/00

    CPC classification number: G01V5/0008

    Abstract: A detection apparatus comprises a freely-movable integral framework provided with front wheels and rear wheels, characterized in that, a control portion and a scan portion, and a driving mechanism driving said framework to move are provided on said framework, wherein said framework is provided with a first interface for connecting to external power, so that said detection apparatus is driven by external power via the driving mechanism to perform detection while conducting detection on site, and wherein the semitrailer for mounting the framework is provided with a second interface connectable to a traction apparatus so as to connect the detection apparatus and the traction apparatus while carrying out site-changing transportation. Said detection apparatus is not affected by the alteration of the emission standards, has low failure rate and maintenance cost, has zero emission in the detection state, and is pollution-free.

    Abstract translation: 检测装置包括设置有前轮和后轮的可自由移动的整体框架，其特征在于，在所述框架上设置有控制部分和扫描部分以及驱动所述框架移动的驱动机构，其中提供所述框架 具有用于连接到外部电力的第一接口，使得所述检测装置经由驱动机构由外部电力驱动，以在现场进行检测时执行检测，并且其中用于安装框架的半挂车设置有可连接到 牵引装置，以便在进行现场改变运输时连接检测装置和牵引装置。 所述检测装置不受排放标准变更的影响，故障率低，维护成本低，检测状态为零排放，无污染。

    MASK DESIGN AND OPC FOR DEVICE MANUFACTURE
    9.
    发明申请
    MASK DESIGN AND OPC FOR DEVICE MANUFACTURE 失效
    掩模设计和OPC设备制造

    公开(公告)号：US20110318672A1

    公开(公告)日：2011-12-29

    申请号：US12824037

    申请日：2010-06-25

    Applicant: Shem Ogadhoh ,  Raguraman Venkatesan ,  Kevin J. Hooker ,  Sungwon Kim ,  Bin Hu ,  Vivek Singh ,  Bikram Baidya ,  Prasad Narendra Atkar ,  Seongtae Jeong

    Inventor： Shem Ogadhoh ,  Raguraman Venkatesan ,  Kevin J. Hooker ,  Sungwon Kim ,  Bin Hu ,  Vivek Singh ,  Bikram Baidya ,  Prasad Narendra Atkar ,  Seongtae Jeong

    IPC: G03F1/00 ,  G06F17/50

    CPC classification number: G03F1/36 ,  G03F1/68 ,  G06F17/50

    Abstract: Described herein is mask design and modeling for a set of masks to be successively imaged to print a composite pattern on a substrate, such as a semiconductor wafer. Further described herein is a method of double patterning a substrate with the set of masks. Also described herein is a method of correcting a drawn pattern of one of the mask levels based on a predicted pattern contour of the other of the mask levels. Also described herein is a method of modeling a resist profile contour for a mask level in which photoresist is applied onto a inhomogeneous substrate, as well as method of predicting a resist profile of a Boolean operation of two masks.

    Abstract translation: 这里描述的是要连续成像以在诸如半导体晶片的衬底上打印复合图案的一组掩模的掩模设计和建模。 本文进一步描述的是使用该组掩模对衬底进行双重图案化的方法。 这里还描述了一种基于掩模级别中的另一个的预测图案轮廓来校正掩模级中的一个的绘制图案的方法。 本文还描述了一种对光致抗蚀剂施加到非均匀衬底上的掩模级的抗蚀剂轮廓轮廓建模方法，以及预测两个掩模的布尔运算的抗蚀剂轮廓的方法。

    Electronic device support
    10.
    发明授权
    Electronic device support 失效
    电子设备支持

    公开(公告)号：US07980737B2

    公开(公告)日：2011-07-19

    申请号：US12494313

    申请日：2009-06-30

    Applicant: Rui-Bin Hu

    Inventor： Rui-Bin Hu

    IPC: F21V19/00

    CPC classification number: F16M13/00 ,  F16M11/10 ,  F16M11/38 ,  F21V33/0048 ,  Y10T16/558

    Abstract: An electronic device support includes a V-shaped base, a supporting leg, a cable and a number of lights. The V-shaped base includes a pair of legs extending from an apex of the V-shaped base. The supporting leg is pivotably connected to the V-shaped base adjacent to the apex. The cable is embedded in at least one of the legs and the supporting leg and includes a connector plug electrically connected to the other end. The lights are rotatably mounted on one of the distal end of the legs of the base away from the apex of the V-shaped base.

    Abstract translation: 电子设备支撑件包括V形底座，支撑腿，电缆和多个灯。 V形基部包括从V形基部的顶点延伸的一对腿。 支撑腿可枢转地连接到邻近顶点的V形基部。 电缆嵌入到至少一个腿和支撑腿中，并且包括电连接到另一端的连接器插头。 灯可旋转地安装在基座的腿的远端远离V形基座的顶点。

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