This invention provides a novel material development apparatus capable of automatically and efficiently forming uniform novel materials with reduced impurities and different compositions individually on respective cells. The novel material development apparatus includes: a plurality of arc plasma guns; a magnetic circuit deflecting/focusing plasma of the arc plasma guns; a controller thereof; and a plurality of deposition cells. For film deposition, plasma containing ions of constituent elements and generated in a pulsed manner by the arc plasma guns are focused to the deposition cell by the magnetic circuit. We can switch the deposition cells by using the moving stage or by using the magnetic circuit changing a focus point, or we can change a focus point by using magnetic circuit so that collectively form uniform novel materials with reduced impurities and different compositions of alloys or compounds efficiently.