- 专利标题： Low viscosity precursor compositions and methods for the deposition of conductive electronic features
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申请号： US11642720申请日： 2006-12-21
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公开(公告)号： US20070104881A1公开(公告)日： 2007-05-10
- 发明人: Toivo Kodas , Mark Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron Stump , Allen Schult , Paolina Atanassova , Klaus Kunze
- 申请人： Toivo Kodas , Mark Hampden-Smith , Karel Vanheusden , Hugh Denham , Aaron Stump , Allen Schult , Paolina Atanassova , Klaus Kunze
- 申请人地址： US MA Boston
- 专利权人： Cabot Corporation
- 当前专利权人： Cabot Corporation
- 当前专利权人地址： US MA Boston
- 主分类号： B05D3/02
- IPC分类号： B05D3/02
摘要：
A precursor composition for the deposition and formation of an electrical feature such as a conductive feature. The precursor composition advantageously has a low viscosity enabling deposition using direct-write tools. The precursor composition also has a low conversion temperature, enabling the deposition and conversion to an electrical feature on low temperature substrates. A particularly preferred precursor composition includes silver metal for the formation of highly conductive silver features.
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