发明申请
- 专利标题： Sensor for use in a lithographic apparatus
- 专利标题（中）： 用于光刻设备的传感器
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申请号： US11591674申请日： 2006-11-02
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公开(公告)号： US20070108377A1公开(公告)日： 2007-05-17
- 发明人: Haico Kok , Marcus Van De Kerkhof , Borgert Kruizinga , Timotheus Sengers , Bearrach Moest , Marc Antonius Haast , Peter Weissbrodt , Manfred Helmut Gustav Schrenk , Torsten Harzendorf
- 申请人： Haico Kok , Marcus Van De Kerkhof , Borgert Kruizinga , Timotheus Sengers , Bearrach Moest , Marc Antonius Haast , Peter Weissbrodt , Manfred Helmut Gustav Schrenk , Torsten Harzendorf
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 主分类号： H01J40/14
- IPC分类号： H01J40/14 ; H01J3/14 ; H01J5/16
摘要：
A sensor for use at substrate level in a high numerical aperture lithographic apparatus, the sensor having a transparent plate that covers a sensing element and includes elements that improve coupling of radiation into the sensing element. The improved coupling elements include a flowing liquid medium disposed between the transparent plate and the sensing element.
公开/授权文献
- US08629418B2 Lithographic apparatus and sensor therefor 公开/授权日：2014-01-14
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