发明申请
- 专利标题： Rinse method and developing apparatus
- 专利标题（中）： 冲洗方法和显影装置
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申请号： US11602390申请日： 2006-11-21
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公开(公告)号： US20070119479A1公开(公告)日： 2007-05-31
- 发明人: Kousuke Yoshihara , Junji Nakamura , Hirofumi Takeguchi , Taro Yamamoto
- 申请人： Kousuke Yoshihara , Junji Nakamura , Hirofumi Takeguchi , Taro Yamamoto
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 优先权： JPJP2005-343914 20051129
- 主分类号： B08B7/04
- IPC分类号： B08B7/04 ; B08B3/00
摘要：
A rinse method for rinsing a substrate having an exposure pattern thereon developed includes presetting conditions for a rinse process according to surface states of the substrate, measuring a surface state of the substrate, selecting a corresponding condition for the rinse process based on the measured surface state of the substrate, and performing the rinse process under the selected condition.
公开/授权文献
- US08029624B2 Rinse method and developing apparatus 公开/授权日：2011-10-04
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