Invention Application
- Patent Title: Quantum dot laser diode and method of manufacturing the same
- Patent Title (中): 量子点激光二极管及其制造方法
-
Application No.: US11607516Application Date: 2006-12-01
-
Publication No.: US20070128839A1Publication Date: 2007-06-07
- Inventor: Jin Soo Kim , Jin Hong Lee , Sung Hong , Ho Sang Kwack , Byung Seok Choi , Dae Kon Oh
- Applicant: Jin Soo Kim , Jin Hong Lee , Sung Hong , Ho Sang Kwack , Byung Seok Choi , Dae Kon Oh
- Priority: KR10-2005-0118104 20051206; KR10-2006-0086028 20060907
- Main IPC: H01L21/20
- IPC: H01L21/20 ; H01L21/36 ; H01L31/20

Abstract:
Provided are a quantum dot laser diode and a method of manufacturing the same. The method of manufacturing a quantum dot laser diode includes the steps of: forming a grating structure layer including a plurality of gratings on a substrate; forming a first lattice-matched layer on the grating structure layer; forming at least one quantum dot layer having at least one quantum dot on the first lattice-matched layer; forming a second lattice-matched layer on the quantum dot layer; forming a cladding layer on the second lattice-matched layer; and forming an ohmic contact layer on the cladding layer. Consequently, it is possible to obtain high gain at a desired wavelength without affecting the uniformity of quantum dots, so that the characteristics of a laser diode can be improved.
Public/Granted literature
- US07575943B2 Quantum dot laser diode and method of manufacturing the same Public/Granted day:2009-08-18
Information query
IPC分类: