发明申请
- 专利标题: Fluorine based cleaning of an ion source
- 专利标题(中): 氟离子源清洗
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申请号: US11540469申请日: 2006-09-29
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公开(公告)号: US20070137671A1公开(公告)日: 2007-06-21
- 发明人: William F. DiVergilio , Daniel R. Tieger , William P. Reynolds , Christopher W. Hodgdon , Sean Joyce
- 申请人: William F. DiVergilio , Daniel R. Tieger , William P. Reynolds , Christopher W. Hodgdon , Sean Joyce
- 专利权人: Axcelis Technologies, Inc.
- 当前专利权人: Axcelis Technologies, Inc.
- 主分类号: B08B3/12
- IPC分类号: B08B3/12 ; B08B6/00 ; H01J7/24 ; C23C16/00
摘要:
A deposit cleaning system for removing deposits from interior surfaces of ion sources and/or electrodes includes a fluorine source, a throttle mechanism, and a controller. The fluorine source supplies fluorine to the ion source as a cleaning material. The throttle mechanism mitigates loss of fluorine through a source aperture of the ion source by at least partially covering the source aperture. The controller controls the supply and flow rate from the fluorine source to the ion source and also controls the positioning of the throttle mechanism.
公开/授权文献
- US07531819B2 Fluorine based cleaning of an ion source 公开/授权日:2009-05-12
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