公开(公告)号：US07531819B2

公开(公告)日：2009-05-12

申请号：US11540469

申请日：2006-09-29

申请人： William F. DiVergilio ,  Daniel R. Tieger ,  William P. Reynolds ,  Christopher W. Hodgdon ,  Sean Joyce

发明人： William F. DiVergilio ,  Daniel R. Tieger ,  William P. Reynolds ,  Christopher W. Hodgdon ,  Sean Joyce

IPC分类号： H01J37/08 ,  H01J37/317

CPC分类号： H01J37/3171 ,  B08B7/0035 ,  H01J27/022 ,  H01J37/08 ,  H01J2237/022 ,  H01J2237/31705

摘要： A deposit cleaning system for removing deposits from interior surfaces of ion sources and/or electrodes includes a fluorine source, a throttle mechanism, and a controller. The fluorine source supplies fluorine to the ion source as a cleaning material. The throttle mechanism mitigates loss of fluorine through a source aperture of the ion source by at least partially covering the source aperture. The controller controls the supply and flow rate from the fluorine source to the ion source and also controls the positioning of the throttle mechanism.

摘要翻译： 用于从离子源和/或电极的内表面去除沉积物的沉积物清洁系统包括氟源，节流机构和控制器。 氟源作为清洁材料向离子源供给氟。 节流机构通过至少部分地覆盖源孔径来减轻通过离子源的源孔径的氟的损失。 控制器控制从氟源到离子源的供应和流量，还控制节流机构的定位。

公开(公告)号：US20070137671A1

公开(公告)日：2007-06-21

申请号：US11540469

申请日：2006-09-29

申请人： William F. DiVergilio ,  Daniel R. Tieger ,  William P. Reynolds ,  Christopher W. Hodgdon ,  Sean Joyce

发明人： William F. DiVergilio ,  Daniel R. Tieger ,  William P. Reynolds ,  Christopher W. Hodgdon ,  Sean Joyce

IPC分类号： B08B3/12 ,  B08B6/00 ,  H01J7/24 ,  C23C16/00

CPC分类号： H01J37/3171 ,  B08B7/0035 ,  H01J27/022 ,  H01J37/08 ,  H01J2237/022 ,  H01J2237/31705

摘要： A deposit cleaning system for removing deposits from interior surfaces of ion sources and/or electrodes includes a fluorine source, a throttle mechanism, and a controller. The fluorine source supplies fluorine to the ion source as a cleaning material. The throttle mechanism mitigates loss of fluorine through a source aperture of the ion source by at least partially covering the source aperture. The controller controls the supply and flow rate from the fluorine source to the ion source and also controls the positioning of the throttle mechanism.

摘要翻译： 用于从离子源和/或电极的内表面去除沉积物的沉积物清洁系统包括氟源，节流机构和控制器。 氟源作为清洁材料向离子源供给氟。 节流机构通过至少部分地覆盖源孔径来减轻通过离子源的源孔径的氟的损失。 控制器控制从氟源到离子源的供应和流量，还控制节流机构的定位。