发明申请
US20070148814A1 Process for manufacturing a phase change memory array in Cu-damascene technology and phase change memory array thereby manufactured
有权
因此制造Cu-damascene技术和相变存储器阵列中的相变存储器阵列的制造方法
- 专利标题: Process for manufacturing a phase change memory array in Cu-damascene technology and phase change memory array thereby manufactured
- 专利标题(中): 因此制造Cu-damascene技术和相变存储器阵列中的相变存储器阵列的制造方法
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申请号: US11317622申请日: 2005-12-22
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公开(公告)号: US20070148814A1公开(公告)日: 2007-06-28
- 发明人: Fabio Pellizzer , Roberto Bez , Maria Marangon , Roberta Piva , Laura Aina
- 申请人: Fabio Pellizzer , Roberto Bez , Maria Marangon , Roberta Piva , Laura Aina
- 申请人地址: IT Agrate Brianza
- 专利权人: STMicroelectronics S.r.l.
- 当前专利权人: STMicroelectronics S.r.l.
- 当前专利权人地址: IT Agrate Brianza
- 主分类号: H01L21/06
- IPC分类号: H01L21/06
摘要:
A process for manufacturing a phase change memory array includes the steps of: forming a plurality of phase change memory cells in an array region of a semiconductor wafer, the phase change memory cells arranged in rows and columns according to a row direction and to a column direction, respectively; forming a control circuit in a control region of the semiconductor wafer; forming a plurality of first bit line portions for mutually connecting phase change memory cells arranged on a same column; forming first level electrical interconnection structures; and forming second level electrical interconnection structures above the first level electrical interconnection structures. The first level electrical interconnection structures include second bit line portions laying on and in contact with the first bit line portions and projecting from the first bit line portions in the column direction for connecting the first bit line portions to the control circuit.
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