Invention Application
- Patent Title: System, apparatus, and method for advanced solder bumping
- Patent Title (中): 高级焊锡凸块的系统,设备和方法
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Application No.: US11321103Application Date: 2005-12-29
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Publication No.: US20070152024A1Publication Date: 2007-07-05
- Inventor: Mengzhi Pang , Christopher Bahr , Ravindra Tanikella , Charan Gurumuthy
- Applicant: Mengzhi Pang , Christopher Bahr , Ravindra Tanikella , Charan Gurumuthy
- Main IPC: B23K31/02
- IPC: B23K31/02 ; H01L21/00

Abstract:
According to some embodiments, a method, apparatus, and system are provided. In some embodiments, the method includes providing solder resist material on a surface of a substrate, applying mask material on top of the solder resist material, reflowing solder located in an opening formed through both the solder resist material and the mask material, and removing the mask material after the reflowing of the solder.
Public/Granted literature
- US07517788B2 System, apparatus, and method for advanced solder bumping Public/Granted day:2009-04-14
Information query
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