发明申请
- 专利标题: Gallium nitride-based compound semiconductor multilayer structure and production method thereof
- 专利标题(中): 氮化镓基化合物半导体多层结构及其制备方法
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申请号: US10589610申请日: 2005-02-23
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公开(公告)号: US20070170457A1公开(公告)日: 2007-07-26
- 发明人: Masato Kobayakawa , Hitoshi Takeda , Hisayuki Miki , Tetsuo Sakurai
- 申请人: Masato Kobayakawa , Hitoshi Takeda , Hisayuki Miki , Tetsuo Sakurai
- 申请人地址: JP Minato-Ku, Tokyo 105-8518
- 专利权人: SHOWA DENKO K.K.
- 当前专利权人: SHOWA DENKO K.K.
- 当前专利权人地址: JP Minato-Ku, Tokyo 105-8518
- 优先权: JP2004-048500 20040224
- 国际申请: PCT/JP05/03428 WO 20050223
- 主分类号: H01L33/00
- IPC分类号: H01L33/00
摘要:
An object of the present invention is to provide a gallium nitride compound semiconductor multilayer structure useful for producing a gallium nitride compound semiconductor light-emitting device which operates at low voltage while maintaining satisfactory light emission output. The inventive gallium nitride compound semiconductor multilayer structure comprises a substrate, and an n-type layer, a light-emitting layer, and a p-type layer formed on the substrate, the light-emitting layer having a multiple quantum well structure in which a well layer and a barrier layer are alternately stacked repeatedly, said light-emitting layer being sandwiched by the n-type layer and the p-type layer, wherein the well layer comprises a thick portion and a thin portion, and the barrier layer contains a dopant.
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