Invention Application
- Patent Title: Plasma generating devices and methods for using the same
- Patent Title (中): 等离子体发生装置及其使用方法
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Application No.: US11485222Application Date: 2006-07-11
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Publication No.: US20070170995A1Publication Date: 2007-07-26
- Inventor: David Dutton , Arthur Schleifer , Robert Taber , Karen Seward
- Applicant: David Dutton , Arthur Schleifer , Robert Taber , Karen Seward
- Main IPC: H03B7/14
- IPC: H03B7/14

Abstract:
Aspects of the invention include plasma generating devices and systems thereof, as well as methods of using the same in plasma generation. Embodiments of the plasma generating devices include a resonator having a discharge gap and a ground plane disposed on opposing sides of a substrate; and a gas flow element configured to flow gas through the discharge gap. In using the plasma generating devices, a gas is flowed through the discharge gap and sufficient power is applied to the resonator to produce a plasma, e.g., in the form of a plasma jet, at the discharge gap. The subject devices and methods find use in a variety of different applications.
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