System and method for removal of photoresist in transistor fabrication for integrated circuit manufacturing
    1.
    发明授权
    System and method for removal of photoresist in transistor fabrication for integrated circuit manufacturing 有权
    用于集成电路制造的晶体管制造中去除光致抗蚀剂的系统和方法

    公开(公告)号:US07799685B2

    公开(公告)日:2010-09-21

    申请号:US10958866

    申请日:2004-10-04

    Abstract: In a technique for fabricating an integrated circuit to include an active device structure which supports an electrical interconnect structure, a photoresist layer is used prior to forming an electrical interconnect structure on the active device structure. The photoresist and related residues are removed by exposing the photoresist and exposed regions of the active device structure to one or more reactive species that are generated using a gas mixture including hydrogen gas, as a predominant source of the reactive species, in a plasma source such that the photoresist and residues are continuously exposed to hydrogen-based reactive species. An associated system architecture is described which provides for a substantial flow of hydrogen gas in the process chamber.

    Abstract translation: 在用于制造集成电路以包括支持电互连结构的有源器件结构的技术中,在有源器件结构上形成电互连结构之前,使用光致抗蚀剂层。 通过将活性器件结构的光致抗蚀剂和暴露区域暴露于一种或多种使用包含作为反应性物质的主要来源的氢气的气体混合物在等离子体源中产生的反应性物质来除去光致抗蚀剂和相关残余物,例如 光致抗蚀剂和残留物连续暴露于基于氢的反应物种。 描述了相关联的系统架构,其提供了处理室中的大量氢气流。

    Personal viewing device
    2.
    发明申请
    Personal viewing device 审中-公开
    个人观察设备

    公开(公告)号:US20080092083A1

    公开(公告)日:2008-04-17

    申请号:US11546434

    申请日:2006-10-12

    CPC classification number: G06F3/04815 G06F3/0346

    Abstract: A method of using a personal viewing device that has a display includes sensing a coordinate and an attitude of the personal viewing device and then calculating display data based on stored object data, the coordinate and the attitude. The method further includes displaying on the display a representation of the object in response to the display data.

    Abstract translation: 使用具有显示器的个人观看设备的方法包括感测个人观看设备的坐标和姿态,然后基于存储的对象数据,坐标和姿态来计算显示数据。 该方法还包括响应于显示数据在显示器上显示对象的表示。

    Plasma generating devices having alternative ground geometry and methods for using the same
    4.
    发明申请
    Plasma generating devices having alternative ground geometry and methods for using the same 审中-公开
    具有替代地面几何形状的等离子体产生装置及其使用方法

    公开(公告)号:US20070170996A1

    公开(公告)日:2007-07-26

    申请号:US11485051

    申请日:2006-07-11

    CPC classification number: H01J37/32192 H01J37/32247 H01J37/32825

    Abstract: Aspects of the invention include plasma generating devices having alternative ground geometries and systems thereof, as well as methods of using the same in plasma generation. The plasma generating devices of the invention include a resonator with a discharge gap disposed on a substrate and a ground element. Embodiments of the ground element of the plasma generating devices of the invention include those that are internal, external, coplanar or a combination thereof. The subject plasma generating devices, systems and methods find use in a variety of different applications.

    Abstract translation: 本发明的方面包括具有替代地面几何形状及其系统的等离子体产生装置,以及在等离子体产生中使用该等离子体产生装置的方法。 本发明的等离子体产生装置包括具有设置在基板上的放电间隙的谐振器和接地元件。 本发明的等离子体产生装置的接地元件的实施例包括内部,外部,共面或其组合的那些。 主题等离子体产生装置,系统和方法可用于各种不同的应用。

    Wire drawing machinery
    5.
    发明授权
    Wire drawing machinery 失效
    拉丝机械

    公开(公告)号:US3979940A

    公开(公告)日:1976-09-14

    申请号:US519287

    申请日:1974-10-30

    CPC classification number: B21C1/04 B21C1/12

    Abstract: In a machine for reducing the cross-section of a number of wires by drawing each of them through a respective series of dies of decreasing diameter, a corresponding series of individual capstans is used for drawing each wire through its series of dies, and each one of several drive shafts supports at spaced positions along its length the capstans of a respective drawing stage of each series. Each capstan is driven by the shaft on which it is mounted, and the drive mechanism for the shafts can be adjusted, by presetting or otherwise, to give different peripheral speed ratios to the capstans, to suit different die sets and/or to compensate for wear. The capstans are mounted between bearings supporting the shafts, and the drive mechanism is located outside the bearing at the relevant end of the shaft. Preferably mechanism coupling adjacent shafts alternates between the two ends of the machine.

    Abstract translation: 在用于通过将它们中的每一个通过相应的直径减小的模具拉伸而减少多个电线的横截面的机器中,使用相应的一系列单独的绞盘来绘制每个电线通过其一系列模具,并且每个 几个驱动轴沿其长度的间隔位置支撑每个系列的相应牵引级的绞盘。 每个主导轴由安装在其上的轴驱动,并且可以通过预设或以其他方式调节轴的驱动机构,以向绞盘提供不同的圆周速度比,以适应不同的模具组和/或补偿 穿。 绞盘安装在支撑轴的轴承之间,驱动机构位于轴的相关端部处的轴承外部。 优选地,相邻轴的机构联接在机器的两端之间交替。

    Surface contamination detection
    6.
    发明申请
    Surface contamination detection 失效
    表面污染检测

    公开(公告)号:US20070229819A1

    公开(公告)日:2007-10-04

    申请号:US11397064

    申请日:2006-04-04

    CPC classification number: G01J3/443 G01J3/02 G01J3/0272 G01N21/67 G01N21/94

    Abstract: A contamination detector in accordance with one embodiment of the invention includes a plasma generation system operable to direct an atmospheric plasma discharge towards a surface. The contamination detector further includes a light capture system to capture light generated by interaction of the atmospheric plasma discharge with the surface. The light capture system guides the captured light to an optical detection system configured to detect a contaminant.

    Abstract translation: 根据本发明的一个实施例的污染检测器包括等离子体产生系统,其可操作以将大气等离子体放电引向表面。 污染检测器还包括光捕获系统,以捕获由大气等离子体放电与表面的相互作用产生的光。 光捕获系统将捕获的光引导到被配置为检测污染物的光学检测系统。

    Contactless area testing apparatus and method utilizing device switching
    7.
    发明申请
    Contactless area testing apparatus and method utilizing device switching 审中-公开
    非接触式区域测试装置和方法利用设备切换

    公开(公告)号:US20060279297A1

    公开(公告)日:2006-12-14

    申请号:US11150548

    申请日:2005-06-10

    CPC classification number: G01R19/0061 G09G3/006 G09G3/3225 G09G2300/0842

    Abstract: A probe is locatable adjacent a selected region of a device under test (DUT), the selected region having a plurality of contacts. A generator is capable of establishing a plume of a ionized gas between the probe and the selected region of the DUT, the plume having sufficient cross-sectional area and electrical conductivity to complete an electrical connection between the probe and the plurality of contacts.

    Abstract translation: 探针可邻近待测器件(DUT)的选定区域定位,所选择的区域具有多个触点。 发生器能够在探针和DUT的选定区域之间建立电离气体的羽流,羽流具有足够的横截面积和电导率,以完成探针与多个触点之间的电连接。

    Systems and methods for a contactless electrical probe
    8.
    发明申请
    Systems and methods for a contactless electrical probe 审中-公开
    非接触式电探头的系统和方法

    公开(公告)号:US20060139039A1

    公开(公告)日:2006-06-29

    申请号:US11020337

    申请日:2004-12-23

    CPC classification number: G01R1/072 G01R31/305 G09G3/006 G09G3/3208

    Abstract: There is disclosed a contactless test probe using an ionized gas discharge for making electrical contact with the device under test (DUT). In one embodiment the ionized gas discharge is at or below atmospheric pressure thereby reducing the complexity of the control environment. In one embodiment, the atmospheric gas discharge, i.e. the electrical probing medium, is created and controlled by a micro-hollow cathode. In a further embodiment an extension gate is used to extend/retard the range of the high-density discharge.

    Abstract translation: 公开了一种使用电离气体放电与被测器件(DUT)进行电接触的非接触式测试探针。 在一个实施例中,电离气体放电处于或低于大气压,从而降低了控制环境的复杂性。 在一个实施例中,大气气体放电,即电探测介质,由微空心阴极产生和控制。 在另一实施例中,延伸门用于延伸/延迟高密度放电的范围。

    System and method for removal of photoresist in transistor fabrication for integrated circuit manufacturing
    9.
    发明申请
    System and method for removal of photoresist in transistor fabrication for integrated circuit manufacturing 有权
    用于集成电路制造的晶体管制造中去除光致抗蚀剂的系统和方法

    公开(公告)号:US20050112883A1

    公开(公告)日:2005-05-26

    申请号:US10958866

    申请日:2004-10-04

    Abstract: In a technique for fabricating an integrated circuit to include an active device structure which supports an electrical interconnect structure, a photoresist layer is used prior to forming an electrical interconnect structure on the active device structure. The photoresist and related residues are removed by exposing the photoresist and exposed regions of the active device structure to one or more reactive species that are generated using a gas mixture including hydrogen gas, as a predominant source of the reactive species, in a plasma source such that the photoresist and residues are continuously exposed to hydrogen-based reactive species. An associated system architecture is described which provides for a substantial flow of hydrogen gas in the process chamber.

    Abstract translation: 在用于制造集成电路以包括支持电互连结构的有源器件结构的技术中,在有源器件结构上形成电互连结构之前,使用光致抗蚀剂层。 通过将活性器件结构的光致抗蚀剂和暴露区域暴露于一种或多种使用包含作为反应性物质的主要来源的氢气的气体混合物在等离子体源中产生的反应性物质来除去光致抗蚀剂和相关残余物,例如 光致抗蚀剂和残留物连续暴露于基于氢的反应物种。 描述了相关联的系统架构,其提供了处理室中的大量氢气流。

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