发明申请
- 专利标题: METHOD OF FABRICATING A QUASI-SUBSTARTE WAFER AND SEMICONDUCTOR BODY FABRICATED USING SUCH A QUASI-SUBSTARTE WAFER
- 专利标题(中): 使用这种基准晶体波形制造准二次晶体波形和半导体体的方法
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申请号: US11668718申请日: 2007-01-30
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公开(公告)号: US20070175384A1公开(公告)日: 2007-08-02
- 发明人: Georg Bruderl , Christoph Eichler , Uwe Strauss
- 申请人: Georg Bruderl , Christoph Eichler , Uwe Strauss
- 申请人地址: DE Regensburg 93049
- 专利权人: OSRAM OPTO SEMICONDUCTORS GMBH
- 当前专利权人: OSRAM OPTO SEMICONDUCTORS GMBH
- 当前专利权人地址: DE Regensburg 93049
- 优先权: DE10200604398.7 20060131; DE102006007293.6 20060216
- 主分类号: C30B23/00
- IPC分类号: C30B23/00 ; C30B19/00 ; C30B25/00
摘要:
Disclosed are a method of fabricating a quasi-substrate wafer (17) with a subcarrier wafer (4) and a growth layer (120), and a semiconductor body fabricated using such a quasi-substrate wafer (17). In the method of fabricating a quasi-substrate wafer (17), a growth substrate wafer (1) is fabricated that is provided with a separation zone (2) and comprises the desired material of the growth layer (120). The growth substrate wafer (1) is provided with a stress that counteracts a stress generated by the formation of the separation zone, and/or the stress generated by the formation of the separation zone is distributed, by structuring a first main face (101) of the growth substrate wafer (1) and/or the separation zone (2), to a plurality of subregions along the first main face (101). The growth substrate wafer (1) with separation zone (2) exhibits no or only slight bowing.
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