- 专利标题: Method of determining lens materials for a projection exposure apparatus
-
申请号: US11657925申请日: 2007-01-25
-
公开(公告)号: US20070195423A1公开(公告)日: 2007-08-23
- 发明人: Vladimir Kamenov , Daniel Kraehmer , Michael Totzeck , Toralf Gruner , Aurelian Dodoc , David Shafer , Wilhelm Ulrich , Rudolf Buenau , Hans-Juergen Mann , Alexander Epple
- 申请人: Vladimir Kamenov , Daniel Kraehmer , Michael Totzeck , Toralf Gruner , Aurelian Dodoc , David Shafer , Wilhelm Ulrich , Rudolf Buenau , Hans-Juergen Mann , Alexander Epple
- 主分类号: G02B3/00
- IPC分类号: G02B3/00
摘要:
A method of determining materials of lenses contained in an optical system of a projection exposure apparatus is described. First, for each lens of a plurality of the lenses, a susceptibility factor KLT/LH is determined. This factor is a measure of the susceptibility of the respective lens to deteriorations caused by at least one of lifetime effects and lens heating effects. Then a birefringent fluoride crystal is selected as a material for each lens for which the susceptibility factor KLT/LH is above a predetermined threshold. Theses lenses are assigned to a first set of lenses. For these lenses, measures are determined for reducing adverse effects caused by birefringence inherent to the fluoride crystals.
公开/授权文献
- US07463422B2 Projection exposure apparatus 公开/授权日:2008-12-09
信息查询