发明申请
- 专利标题： Composition and method to polish silicon nitride
- 专利标题（中）： 抛光氮化硅的组成和方法
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申请号： US11374238申请日： 2006-03-13
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公开(公告)号： US20070209287A1公开(公告)日： 2007-09-13
- 发明人: Zhan Chen , Robert Vacassy , Phillip Carter , Jeffrey Dysard
- 申请人： Zhan Chen , Robert Vacassy , Phillip Carter , Jeffrey Dysard
- 申请人地址： US IL Aurora
- 专利权人： Cabot Microelectronics Corporation
- 当前专利权人： Cabot Microelectronics Corporation
- 当前专利权人地址： US IL Aurora
- 主分类号： B24D3/02
- IPC分类号： B24D3/02 ; B24B7/30 ; B24B29/00 ; C09K3/14 ; B24B1/00
摘要：
The inventive chemical-mechanical polishing composition comprises an abrasive, a nitride accelerator, and water, and has a pH of about 1 to about 6. The inventive method of polishing a substrate involves the use of the aforesaid polishing composition and is particularly useful in polishing a substrate containing silicon nitride.
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