Compositions and methods for polishing silicon nitride materials
    3.
    发明申请
    Compositions and methods for polishing silicon nitride materials 有权
    用于研磨氮化硅材料的组合物和方法

    公开(公告)号:US20070298612A1

    公开(公告)日:2007-12-27

    申请号:US11448205

    申请日:2006-06-07

    IPC分类号: C03C15/00 H01L21/302

    摘要: The present invention provides a method for polishing silicon nitride-containing substrates. The method comprises abrading a surface of a silicon nitride substrate with a polishing composition, which comprises colloidal silica, at least one acidic component, and an aqueous carrier. The at least one acidic component has a pKa in the range of about 1 to 4.5. The composition has a pH in the range of about 0.5 pH units less than the pKa of the at least one acidic component to about 1.5 pH units greater than the pKa.

    摘要翻译: 本发明提供一种研磨含氮化硅的基板的方法。 该方法包括用抛光组合物研磨氮化硅衬底的表面,抛光组合物包括胶体二氧化硅,至少一种酸性组分和水性载体。 所述至少一种酸性组分的pKa在约1至4.5的范围内。 所述组合物的pH值比所述至少一种酸性组分的pKa小约0.5pH单位至大于pKa约1.5pH单位。

    Oxidation-stabilized CMP compositions and methods
    4.
    发明申请
    Oxidation-stabilized CMP compositions and methods 失效
    氧化稳定的CMP组合物和方法

    公开(公告)号:US20070219104A1

    公开(公告)日:2007-09-20

    申请号:US11384538

    申请日:2006-03-20

    IPC分类号: B08B7/00

    摘要: The present invention provides a chemical-mechanical polishing (CMP) composition comprising an amino compound, a radical-forming oxidizing agent, a radical trapping agent capable of inhibiting radical-induced oxidation of the amino compound, and an aqueous carrier therefore. The radical trapping agent is a hydroxyl-substituted polyunsaturated cyclic compound, a nitrogenous compound, or a combination thereof. Optionally, the composition comprises a metal oxide abrasive (e.g., silica, alumina, titania, ceria, zirconia, or a combination of two or more of the foregoing abrasives). The invention further provides a method of chemically-mechanically polishing a substrate with the CMP compositions, as well as a method of enhancing the shelf-life of CMP compositions containing an amine and a radical-forming oxidizing agent, in which a radical trapping agent is added to the CMP composition.

    摘要翻译: 本发明提供一种包含氨基化合物,自由基形成氧化剂,能够抑制氨基化合物自由基诱导氧化的自由基捕获剂的化学机械抛光(CMP)组合物,以及含水载体。 自由基捕获剂是羟基取代的多不饱和环状化合物,含氮化合物或其组合。 任选地,组合物包含金属氧化物研磨剂(例如二氧化硅,氧化铝,二氧化钛,二氧化铈,氧化锆,或两种或更多种前述研磨剂的组合)。 本发明还提供了用CMP组合物对基材进行化学机械抛光的方法,以及提高含有胺和自由基形成氧化剂的CMP组合物的保存期限的方法,其中自由基捕获剂是 添加到CMP组合物中。

    Anti-glare reflective and transmissive devices
    6.
    发明申请
    Anti-glare reflective and transmissive devices 审中-公开
    防眩光反射和透射装置

    公开(公告)号:US20060221452A1

    公开(公告)日:2006-10-05

    申请号:US11373579

    申请日:2006-03-10

    申请人: Zhan Chen

    发明人: Zhan Chen

    IPC分类号: G02B5/08

    CPC分类号: B60R1/088 G02F1/13725

    摘要: Devices that include a dichroic material sandwiched between first and second electrodes layers and exhibiting a high optical absorption when the first and second electrode layers are biased at a first electrical bias state and a low optical absorption when the first and second electrode layers are biased at a second, different electrical bias state. Such devices may be used to construct optically reflective devices such as anti-glare mirrors and optically transmissive devices such as eye glasses. The dichroic material may be selected to be operable to switch between the high optical absorption and the low optical absorption in less than 0.1 second.

    摘要翻译: 包括夹在第一和第二电极层之间的二向色材料的装置,并且当第一和第二电极层被偏置在第一电偏置状态时呈现高的光吸收,而当第一和第二电极层被偏置在 第二,不同的电偏置状态。 这种装置可用于构造光学反射装置,例如防眩光镜和诸如眼镜的光学透射装置。 二色性材料可以被选择为可操作以在小于0.1秒内在高光吸收和低光吸收之间切换。

    HIGH STABLE NON-IONIC N-VINYL BUTYROLACTAM IODINE AND PREPARATION METHOD THEREOF
    7.
    发明申请
    HIGH STABLE NON-IONIC N-VINYL BUTYROLACTAM IODINE AND PREPARATION METHOD THEREOF 审中-公开
    高稳定性非离子型N-乙烯基丁酰胺碘化物及其制备方法

    公开(公告)号:US20130296576A1

    公开(公告)日:2013-11-07

    申请号:US13978329

    申请日:2011-08-18

    申请人: Yu Wang Zhan Chen

    发明人: Yu Wang Zhan Chen

    IPC分类号: C07D207/267

    摘要: The present invention relates to a preparation method of a high-stable non-ionic N-vinyl butyrolactam iodine, wherein non-ionic N-vinyl butyrolactam, iodine and at least one grinding aid are stirred at 150-800 r/min at a temperature of 50° C.-90° C. for 1 to 12 hours to prepare the high-stable non-ionic N-vinyl butyrolactam iodine, wherein the K value of the non-ionic N-vinyl butyrolactam is 32±1, the PD value of the main peak of the non-ionic N-vinyl butyrolactam is ≦1.6, the moisture content of the non-ionic N-vinyl butyrolactam is ≦2.5%, preferably, the grinding aid is selected one or several from sodium chloride, sodium citrate, sodium carbonate and sodium phosphate, the amount of the grinding aid added is 0.02 to 2% of the total amount of the non-ionic N-vinyl butyrolactam and the iodine, the non-ionic N-vinyl butyrolactam is PVP-K32, the high-stable non-ionic N-vinyl butyrolactam iodine prepared by the above mentioned method is also provided, the stability of the high-stable non-ionic N-vinyl butyrolactam iodine of the present invention is high, thereby facilitating long-term storage and use, thus the high-stable non-ionic N-vinyl butyrolactam iodine is suitable for large-scale popularization.

    摘要翻译: 本发明涉及一种高稳定性非离子型N-乙烯基丁内酰胺碘的制备方法,其中非离子N-乙烯基丁内酰胺碘和至少一种研磨助剂以150-800r / min的温度 在50℃-90℃下反应1至12小时以制备高稳定性非离子型N-乙烯基丁内酰胺碘,其中非离子型N-乙烯基丁内酰胺的K值为32±1,PD 非离子型N-乙烯基丁内酰胺的主峰的值为1.6,非离子型N-乙烯基丁内酰胺的水分含量为2.5%,优选的是,研磨助剂由氯化钠,钠 柠檬酸钠,碳酸钠和磷酸钠,加入的助磨剂的量为非离子型N-乙烯基丁内酰胺和碘的总量的0.02〜2%,非离子型N-乙烯基丁内酰胺为PVP-K32, 还提供了通过上述方法制备的高稳定性非离子型N-乙烯基丁内酰胺碘,稳定性高 本发明的离子型N-乙烯基丁内酰胺碘高,从而促进长期保存和使用,因此高稳定性的非离子型N-乙烯基丁内酰胺碘适用于大规模普及。

    Oxidation-stabilized CMP compositions and methods
    8.
    发明授权
    Oxidation-stabilized CMP compositions and methods 有权
    氧化稳定的CMP组合物和方法

    公开(公告)号:US08497209B2

    公开(公告)日:2013-07-30

    申请号:US12764268

    申请日:2010-04-21

    IPC分类号: H01L21/302 H01L21/321

    摘要: The present invention provides a chemical-mechanical polishing (CMP) composition comprising an amino compound, a radical-forming oxidizing agent, a radical trapping agent capable of inhibiting radical-induced oxidation of the amino compound, and an aqueous carrier therefore. The radical trapping agent is a hydroxyl-substituted polyunsaturated cyclic compound, a nitrogenous compound, or a combination thereof. Optionally, the composition comprises a metal oxide abrasive (e.g., silica, alumina, titania, ceria, zirconia, or a combination of two or more of the foregoing abrasives).

    摘要翻译: 本发明提供一种包含氨基化合物,自由基形成氧化剂,能够抑制氨基化合物自由基诱导氧化的自由基捕获剂的化学机械抛光(CMP)组合物,以及含水载体。 自由基捕获剂是羟基取代的多不饱和环状化合物,含氮化合物或其组合。 任选地,组合物包含金属氧化物研磨剂(例如二氧化硅,氧化铝,二氧化钛,二氧化铈,氧化锆,或两种或更多种前述研磨剂的组合)。

    CONTROL METHOD OF TRANSMITTING STREAMING AUDIO/VIDEO DATA AND ARCHITECTURE THEREOF
    9.
    发明申请
    CONTROL METHOD OF TRANSMITTING STREAMING AUDIO/VIDEO DATA AND ARCHITECTURE THEREOF 审中-公开
    传输音频/视频数据及其架构的控制方法

    公开(公告)号:US20100235530A1

    公开(公告)日:2010-09-16

    申请号:US12703292

    申请日:2010-02-10

    IPC分类号: G06F15/16

    CPC分类号: H04N7/24

    摘要: A control method and architecture for controlling transmission of streaming audio/video data are disclosed. The method uses a report transmission rate on a transmitter to reduce the playback latency on a receiver. The report transmission rate is determined according to an actual transmission rate and the residual data amount of the previous period of a transmitter buffer. The actual transmission rate is the minimum of an available transmission rate and a required transmission rate, which depends on the residual data amount and the report transmission rate. Therefore, the report transmission rate is adjusted according to the accumulation of residual data of transmitter buffer, which improves the playback latency.

    摘要翻译: 公开了一种用于控制流式音频/视频数据传输的控制方法和架构。 该方法使用发射机上的报告传输速率来减少接收机上的播放延迟。 报告传输速率根据发射机缓冲器的实际传输速率和前一周期的剩余数据量来确定。 实际传输速率是可用传输速率和所需传输速率的最小值,这取决于剩余数据量和报告传输速率。 因此,根据发送缓冲区的残差数据的累积调整报告传输速率,提高播放延迟。

    OXIDATION-STABILIZED CMP COMPOSITIONS AND METHODS
    10.
    发明申请
    OXIDATION-STABILIZED CMP COMPOSITIONS AND METHODS 有权
    氧化稳定的CMP组合物和方法

    公开(公告)号:US20100200802A1

    公开(公告)日:2010-08-12

    申请号:US12764268

    申请日:2010-04-21

    IPC分类号: C09K13/00

    摘要: The present invention provides a chemical-mechanical polishing (CMP) composition comprising an amino compound, a radical-forming oxidizing agent, a radical trapping agent capable of inhibiting radical-induced oxidation of the amino compound, and an aqueous carrier therefore. The radical trapping agent is a hydroxyl-substituted polyunsaturated cyclic compound, a nitrogenous compound, or a combination thereof. Optionally, the composition comprises a metal oxide abrasive (e.g., silica, alumina, titania, ceria, zirconia, or a combination of two or more of the foregoing abrasives).

    摘要翻译: 本发明提供一种包含氨基化合物,自由基形成氧化剂,能够抑制氨基化合物自由基诱导氧化的自由基捕获剂的化学机械抛光(CMP)组合物,以及含水载体。 自由基捕获剂是羟基取代的多不饱和环状化合物,含氮化合物或其组合。 任选地,组合物包含金属氧化物研磨剂(例如二氧化硅,氧化铝,二氧化钛,二氧化铈,氧化锆,或两种或更多种前述研磨剂的组合)。