发明申请
US20070209933A1 Sample holding electrode and a plasma processing apparatus using the same
审中-公开
样品保持电极和使用其的等离子体处理装置
- 专利标题: Sample holding electrode and a plasma processing apparatus using the same
- 专利标题(中): 样品保持电极和使用其的等离子体处理装置
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申请号: US11513070申请日: 2006-08-31
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公开(公告)号: US20070209933A1公开(公告)日: 2007-09-13
- 发明人: Ken Yoshioka , Yutaka Omoto , Tsunehiko Tsubone
- 申请人: Ken Yoshioka , Yutaka Omoto , Tsunehiko Tsubone
- 优先权: JP2006-063783 20060309
- 主分类号: C23C14/00
- IPC分类号: C23C14/00
摘要:
A temperature control type sample-holding electrode using a heater capable of enhancing the performance of controlling the electrode temperature and ensuring the uniformity of static adsorption force over the entire surface, the sample-holding electrode being provided in a processing chamber with a sample being disposed thereon, including a dielectric film having a sample-placing surface and a thin electrode film disposed so as to oppose to the sample-placing surface by way of the dielectric film and comprising a layer of a substantially identical height serving both as a static adsorption electrode and a heater electrode, and provided with power source device capable of simultaneously supplying an AC power for heater and DC power for static adsorption to the thin electrode film.
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