发明申请
- 专利标题: Non-volatile memory and the fabrication method
- 专利标题(中): 非易失性存储器及其制造方法
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申请号: US11798364申请日: 2007-05-14
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公开(公告)号: US20070210362A1公开(公告)日: 2007-09-13
- 发明人: Kiyoyuki Morita , Noboru Yamada , Akihito Miyamoto , Takashi Ohtsuka , Hideyuki Tanaka
- 申请人: Kiyoyuki Morita , Noboru Yamada , Akihito Miyamoto , Takashi Ohtsuka , Hideyuki Tanaka
- 申请人地址: JP Osaka
- 专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址: JP Osaka
- 优先权: JP2003-131338 20030509
- 主分类号: H01L27/11
- IPC分类号: H01L27/11
摘要:
A non-volatile memory comprising: a first substrate (100) and a second substrate (110), the first substrate (100) having a plurality of switching elements (4) arranged in matrix, and a plurality of first electrodes (18) connected to the switching element (4), the second substrate (110) having a conductive film (32), and a recording layer (34) whose resistance value changes by application of an electric pulse, wherein the plurality of first electrodes (18) are integrally covered by the recording layer (34), the recording layer (34) thereby being held between the plurality of first electrodes (18) and the conductive film (32); the first substrate (100) further comprising a second electrode (22), the second electrode (22) being electrically connected to the conductive film (32), the voltage of which is maintained at a set level while applying current to the recording layer (34). This non-volatile memory achieves high integration at low cost.
公开/授权文献
- US07394090B2 Non-volatile memory and the fabrication method 公开/授权日:2008-07-01
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