发明申请
- 专利标题： Plasma Enhanced Chemical Vapor Deposition of Metal Oxide
- 专利标题（中）： 等离子体增强化学气相沉积金属氧化物
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申请号： US11547461申请日： 2005-05-20
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公开(公告)号： US20070212486A1公开(公告)日： 2007-09-13
- 发明人: Dmitry Dinega , Christopher Weikart
- 申请人： Dmitry Dinega , Christopher Weikart
- 国际申请： PCT/US05/17747 WO 20050520
- 主分类号： C23C16/40
- IPC分类号： C23C16/40
摘要：
A metal oxide coating can be applied to a substrate at a relatively low temperature and at or near atmospheric pressure by carrying a metal oxide precursor and an oxidizing agent through a corona discharge or a dielectric barrier discharge to form the metal oxide and deposit it onto to the substrate.
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