Plasma Enhanced Chemical Vapor Deposition of Metal Oxide
    1.
    发明申请
    Plasma Enhanced Chemical Vapor Deposition of Metal Oxide 审中-公开
    等离子体增强化学气相沉积金属氧化物

    公开(公告)号:US20070212486A1

    公开(公告)日:2007-09-13

    申请号:US11547461

    申请日:2005-05-20

    IPC分类号: C23C16/40

    摘要: A metal oxide coating can be applied to a substrate at a relatively low temperature and at or near atmospheric pressure by carrying a metal oxide precursor and an oxidizing agent through a corona discharge or a dielectric barrier discharge to form the metal oxide and deposit it onto to the substrate.

    摘要翻译: 金属氧化物涂层可以在相对较低的温度和大气压附近的基底上,通过电晕放电或电介质阻挡放电载入金属氧化物前体和氧化剂,形成金属氧化物并将其沉积到 底物。