发明申请
- 专利标题: COATING AND DEVELOPING APPARATUS, COATING FILM FORMING METHOD, AND STORAGE MEDIUM STORING PROGRAM FOR PERFORMING THE METHOD
- 专利标题(中): 涂料和开发设备,涂膜成型方法和存储方法,用于实施方法
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申请号: US11672230申请日: 2007-02-07
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公开(公告)号: US20070212884A1公开(公告)日: 2007-09-13
- 发明人: Taro Yamamoto , Hideharu Kyouda
- 申请人: Taro Yamamoto , Hideharu Kyouda
- 申请人地址: JP Tokyo
- 专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人: TOKYO ELECTRON LIMITED
- 当前专利权人地址: JP Tokyo
- 优先权: JP2006-031365 20060208
- 主分类号: H01L21/311
- IPC分类号: H01L21/311
摘要:
Disclosed is a technique for preventing a water-repellent protective film formed on a resist film from peeling off during immersion exposure. A resist film is formed on the front surface of a substrate and then the peripheral edge portion of the resist film is removed. Before forming a water-repellent protective film onto the resist film, an adhesion-improving fluid, preferably hexamethyldisilazane gas, for improving the adhesion of the water-repellent protective film, is supplied to the region from which the resist film is removed.