发明申请
US20070232193A1 Substrate holding apparatus, polishing apparatus, and polishing method 有权
基板保持装置,抛光装置和抛光方法

Substrate holding apparatus, polishing apparatus, and polishing method
摘要:
A substrate holding apparatus prevents a substrate from slipping out and allows the substrate to be polished stably. The substrate holding apparatus has a top ring body for holding and pressing a substrate against a polishing surface, and a retainer ring for pressing the polishing surface, the retainer ring being disposed on an outer circumferential portion of the top ring body. The retainer ring comprises a first member made of a magnetic material and a second member having a magnet disposed on a surface thereof which is held in abutment against the first member.
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