发明申请
- 专利标题: APPARATUS AND METHOD FOR PHOTORESIST REMOVAL PROCESSING
- 专利标题(中): 用于光刻胶去除处理的装置和方法
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申请号: US11625026申请日: 2007-01-19
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公开(公告)号: US20070246085A1公开(公告)日: 2007-10-25
- 发明人: Takahiko Wakatsuki , Naoya Hayamizu , Hiroshi Fujita , Akiko Saito , Toshihide Hayashi , Yukinobu Nishibe
- 申请人: Takahiko Wakatsuki , Naoya Hayamizu , Hiroshi Fujita , Akiko Saito , Toshihide Hayashi , Yukinobu Nishibe
- 申请人地址: JP Tokyo
- 专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人: Kabushiki Kaisha Toshiba
- 当前专利权人地址: JP Tokyo
- 优先权: JP2006-12759 20060120
- 主分类号: B08B3/00
- IPC分类号: B08B3/00
摘要:
A processing apparatus includes: a processing chamber configured to process a workpiece; a moving unit configured to move the workpiece in the processing chamber; a first nozzle; a partition member; an inlet provided in communication with the downstream space; and an outlet provided in communication with the upstream space. The first nozzle has a discharge port configured to discharge a processing liquid or a processing gas. The discharge port is opposed to a moving path of the workpiece and the processing liquid or the processing gas is discharged from the discharge port in a discharge direction directed to an upstream side of a moving direction of the workpiece relative to a direction perpendicular to the moving direction. The partition member partitions a space above the moving path in the processing chamber, and the space is partitioned at a position of the first nozzle into an upstream space on the upstream side of the moving direction and a downstream space on a downstream side of the moving direction.