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    Apparatus and method for photoresist removal processing
    3.
    发明授权
    Apparatus and method for photoresist removal processing 有权
    光刻胶去除处理的设备和方法

    公开(公告)号：US08141567B2

    公开(公告)日：2012-03-27

    申请号：US11625081

    申请日：2007-01-19

    申请人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe ,  Tsutomu Makino

    发明人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe ,  Tsutomu Makino

    IPC分类号： B08B3/04

    CPC分类号： B08B3/00 ,  B08B7/00 ,  B08B2230/01 ,  G03F7/427

    摘要： A processing apparatus includes: a tank configured to store water; vapor generating unit configured to turn the water supplied from the tank into vapor; a processing chamber in which vapor supplied from the vapor generating unit is used to remove residues from a workpiece; cooling unit; and filtering unit. The cooling unit cools waste liquid ejected from the processing chamber. The filtering unit is provided between the cooling unit and the tank, and the filtering unit filters the waste liquid cooled in the cooling unit. A processing method includes: supplying vapor into a processing chamber; removing residues from a workpiece using the vapor; cooling waste liquid containing the removed residues to precipitate the residues as solids; and filtering the waste liquid containing the precipitates.

    摘要翻译： 一种处理装置，包括：储存器，用于储存水; 蒸汽发生单元，其构造成将从所述罐供给的水转化为蒸气; 处理室，其中从蒸汽发生单元供应的蒸汽用于从工件中除去残余物; 冷却单元 和过滤单元。 冷却单元冷却从处理室喷出的废液。 过滤单元设置在冷却单元和水箱之间，过滤单元对冷却单元中冷却的废液进行过滤。 一种处理方法包括：将蒸气供应到处理室中; 使用蒸气从工件去除残留物; 冷却含有去除的残余物的废液以将残留物沉淀为固体; 并过滤含有沉淀物的废液。

    PROCESSING APPARATUS AND METHOD
    4.
    发明申请
    PROCESSING APPARATUS AND METHOD 有权
    处理装置和方法

    公开(公告)号：US20070246097A1

    公开(公告)日：2007-10-25

    申请号：US11625592

    申请日：2007-01-22

    申请人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe

    发明人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe

    IPC分类号： F17D3/00

    CPC分类号： B08B3/022 ,  B08B7/00 ,  H01L21/67028 ,  H01L21/67051 ,  Y10T137/0318

    摘要： A processing apparatus includes: a processing chamber configured to contain a workpiece; a first nozzle provided in the processing chamber, the first nozzle discharging vapor onto the workpiece; a wall enclosing the processing chamber; a fluid channel provided inside the wall; a fluid inlet; and a fluid outlet. The fluid inlet is provided in communication with the fluid channel. The fluid outlet is provided in communication with the fluid channel, where a fluid flows into the fluid inlet, passes through the fluid channel, and flows out of the fluid outlet. A processing method for processing a workpiece moving in a processing chamber, the processing method includes: discharging a vapor from a first nozzle toward the workpiece while flowing a fluid through a fluid channel which is provided inside a wall, the wall enclosing the processing chamber.

    摘要翻译： 一种处理装置，包括：处理室，被配置为容纳工件; 设置在所述处理室中的第一喷嘴，所述第一喷嘴将蒸气喷射到所述工件上; 封闭处理室的墙壁; 设置在壁内的流体通道; 流体入口; 和流体出口。 流体入口设置成与流体通道连通。 流体出口设置成与流体通道连通，流体流入流体入口，通过流体通道并从流体出口流出。 一种用于处理在处理室中移动的工件的处理方法，所述处理方法包括：使流体从第一喷嘴朝向工件排出，同时使流体流过设置在壁内部的流体通道，所述流体通道围绕处理室。

    Processing apparatus and method
    5.
    发明授权
    Processing apparatus and method 有权
    处理装置和方法

    公开(公告)号：US08517035B2

    公开(公告)日：2013-08-27

    申请号：US11625592

    申请日：2007-01-22

    申请人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe

    发明人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe

    IPC分类号： B08B3/00

    CPC分类号： B08B3/022 ,  B08B7/00 ,  H01L21/67028 ,  H01L21/67051 ,  Y10T137/0318

    摘要： A processing apparatus includes: a processing chamber configured to contain a workpiece; a first nozzle provided in the processing chamber, the first nozzle discharging vapor onto the workpiece; a wall enclosing the processing chamber; a fluid channel provided inside the wall; a fluid inlet; and a fluid outlet.The fluid inlet is provided in communication with the fluid channel. The fluid outlet is provided in communication with the fluid channel, where a fluid flows into the fluid inlet, passes through the fluid channel, and flows out of the fluid outlet. A processing method for processing a workpiece moving in a processing chamber, the processing method includes: discharging a vapor from a first nozzle toward the workpiece while flowing a fluid through a fluid channel which is provided inside a wall, the wall enclosing the processing chamber.

    摘要翻译： 一种处理装置，包括：处理室，被配置为容纳工件; 设置在所述处理室中的第一喷嘴，所述第一喷嘴将蒸气喷射到所述工件上; 封闭处理室的墙壁; 设置在壁内的流体通道; 流体入口; 和流体出口。 流体入口设置成与流体通道连通。 流体出口设置成与流体通道连通，流体流入流体入口，通过流体通道并从流体出口流出。 一种用于处理在处理室中移动的工件的处理方法，所述处理方法包括：使流体从第一喷嘴朝向工件排出，同时使流体流过设置在壁内部的流体通道，所述流体通道围绕处理室。

    HEATER UNIT, FAN FILTER UNIT, AND SUBSTRATE PROCESSING APPARATUS
    6.
    发明申请
    HEATER UNIT, FAN FILTER UNIT, AND SUBSTRATE PROCESSING APPARATUS 有权
    加热器单元，风扇过滤器单元和基板处理设备

    公开(公告)号：US20120325797A1

    公开(公告)日：2012-12-27

    申请号：US13529404

    申请日：2012-06-21

    申请人： Masaaki FURUYA ,  Munenori IWAMI ,  Takahiko WAKATSUKI ,  Masanori Kondo ,  Katsuya YAMADA

    发明人： Masaaki FURUYA ,  Munenori IWAMI ,  Takahiko WAKATSUKI ,  Masanori Kondo ,  Katsuya YAMADA

    IPC分类号： F27D11/00

    CPC分类号： H01L21/67103 ,  B01D46/10 ,  B01D46/4263 ,  B01D2273/30 ,  H05B3/283 ,  H05B2203/022

    摘要： A heater unit according to an embodiment includes: a flat heater including a linear heating element arranged in a planar pattern; a first mesh body formed in a mesh pattern using a material with high heat conductivity and placed at least on one side of the flat heater facing the flat heater; and a second mesh body formed in a mesh pattern using a material with lower heat conductivity than that of the first mesh body and placed to face a surface of the first mesh body opposite to the surface of the first mesh body facing the flat heater.

    摘要翻译： 根据实施例的加热器单元包括：扁平加热器，其包括以平面图案布置的线性加热元件; 使用具有高导热性的材料以网格图案形成的第一网状体，并且至少放置在面向平面加热器的平面加热器的一侧上; 以及第二网状体，其使用比所述第一网状体的导热性低的材料以网状图案形成，并且与所述第一网状体的与所述第一网状体的面对所述扁平加热器的表面相对的表面放置。

    APPARATUS AND METHOD FOR PHOTORESIST REMOVAL PROCESSING
    7.
    发明申请
    APPARATUS AND METHOD FOR PHOTORESIST REMOVAL PROCESSING 审中-公开
    用于光刻胶去除处理的装置和方法

    公开(公告)号：US20070246085A1

    公开(公告)日：2007-10-25

    申请号：US11625026

    申请日：2007-01-19

    申请人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe

    发明人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe

    IPC分类号： B08B3/00

    CPC分类号： B08B3/022 ,  B08B5/023 ,  C03C17/32 ,  C03C2218/33 ,  H01L21/6708 ,  H05K3/26 ,  H05K2203/075 ,  H05K2203/1509

    摘要： A processing apparatus includes: a processing chamber configured to process a workpiece; a moving unit configured to move the workpiece in the processing chamber; a first nozzle; a partition member; an inlet provided in communication with the downstream space; and an outlet provided in communication with the upstream space. The first nozzle has a discharge port configured to discharge a processing liquid or a processing gas. The discharge port is opposed to a moving path of the workpiece and the processing liquid or the processing gas is discharged from the discharge port in a discharge direction directed to an upstream side of a moving direction of the workpiece relative to a direction perpendicular to the moving direction. The partition member partitions a space above the moving path in the processing chamber, and the space is partitioned at a position of the first nozzle into an upstream space on the upstream side of the moving direction and a downstream space on a downstream side of the moving direction.

    摘要翻译： 一种处理装置，包括：处理室，被配置为处理工件; 移动单元，构造成在处理室中移动工件; 第一个喷嘴; 分隔构件; 与下游空间连通的入口; 以及与上游空间连通的出口。 第一喷嘴具有排出处理液或处理气体的排出口。 排出口与工件的移动路径相对，并且处理气体或处理气体沿着与工件的移动方向的上游侧相对于垂直于移动的方向的排放方向从排出口排出 方向。 分隔构件分隔处理室中的移动路径上方的空间，并且将空间在第一喷嘴的位置分隔成在移动方向的上游侧的上游空间和移动的下游侧的下游空间 方向。

    APPARATUS AND METHOD FOR PHOTORESIST REMOVAL PROCESSING
    8.
    发明申请
    APPARATUS AND METHOD FOR PHOTORESIST REMOVAL PROCESSING 有权
    用于光刻胶去除处理的装置和方法

    公开(公告)号：US20070277853A1

    公开(公告)日：2007-12-06

    申请号：US11625081

    申请日：2007-01-19

    申请人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe ,  Tsutomu Makino

    发明人： Takahiko Wakatsuki ,  Naoya Hayamizu ,  Hiroshi Fujita ,  Akiko Saito ,  Toshihide Hayashi ,  Yukinobu Nishibe ,  Tsutomu Makino

    IPC分类号： B08B3/14 ,  B08B3/10 ,  B08B7/04

    CPC分类号： B08B3/00 ,  B08B7/00 ,  B08B2230/01 ,  G03F7/427

    摘要： A processing apparatus includes: a tank configured to store water; vapor generating unit configured to turn the water supplied from the tank into vapor; a processing chamber in which vapor supplied from the vapor generating unit is used to remove residues from a workpiece; cooling unit; and filtering unit. The cooling unit cools waste liquid ejected from the processing chamber. The filtering unit is provided between the cooling unit and the tank, and the filtering unit filters the waste liquid cooled in the cooling unit. A processing method includes: supplying vapor into a processing chamber; removing residues from a workpiece using the vapor; cooling waste liquid containing the removed residues to precipitate the residues as solids; and filtering the waste liquid containing the precipitates.

    摘要翻译： 一种处理装置，包括：储存器，用于储存水; 蒸汽发生单元，其构造成将从所述罐供给的水转化为蒸气; 处理室，其中从蒸汽发生单元供应的蒸汽用于从工件中除去残余物; 冷却单元 和过滤单元。 冷却单元冷却从处理室喷出的废液。 过滤单元设置在冷却单元和水箱之间，过滤单元对冷却单元中冷却的废液进行过滤。 一种处理方法包括：将蒸气供应到处理室中; 使用蒸气从工件去除残留物; 冷却含有去除的残余物的废液以将残留物沉淀为固体; 并过滤含有沉淀物的废液。